Michael Friedmann
KLA-Tencor
Network
Latest external collaboration on country level. Dive into details by clicking on the dots.
Publication
Featured researches published by Michael Friedmann.
Metrology, inspection, and process control for microlithography. Conference | 2002
Joel L. Seligson; Michael Friedmann; Boris Golovanevsky; Vladimir Levinsky
In order to control and minimize overlay metrology errors, we have to deal with a number of design parameters both in the metrology tool domain and in the overlay target domain. For enhancing the rate of performance improvement vs. technology investment, simulation can be used for modeling both the effects of overlay metrology tool behavior and the impact of target designs on the ultimate metrology performance.
Archive | 2004
Walter D. Mieher; Ady Levy; Boris Golovanesky; Michael Friedmann; Ian Smith; Michael E. Adel; Anatoly Fabrikant
Archive | 2002
Ibrahim Abdulhalim; Mike Adel; Michael Friedmann; Michael Faeyrman
Archive | 2015
Ibrahim Abdulhalim; Mike Adel; Michael Friedmann; Michael Faeyrman
Archive | 2004
Walter D. Mieher; Ady Levy; Boris Golovanesky; Michael Friedmann; Ian Smith; Michael E. Adel; Anatoly Fabrikant; Christopher F. Bevis; Noah Bareket; Kenneth P. Gross; Piotr Zalicki; Dan Wack; Paola Dececco; Thaddeus Gerard Dziura; Mark Ghinovker
Archive | 2006
Daniel Kandel; Kenneth P. Gross; Michael Friedmann; Jiyou Fu; Shankar Krishnan; Boris Golovanevsky
Archive | 2009
Ibrahim Abdulhalim; Mike Adel; Michael Friedmann; Michael Faeyrman
Archive | 2004
Walter D. Mieher; Ady Levy; Boris Golovanevsky; Michael Friedmann; Ian Smith; Michael E. Adel; Anatoly Fabrikant; Christopher F. Bevis; Noah Bareket; Kenneth P. Gross; Piotr Zalicki; Dan Wack; Paola Dececco; Mark Ghinovker; Noam Knoll; Baruch Moshe
Archive | 2006
Michael Friedmann; Jiyou Fu; Boris Golovanevsky; Ken Gross; Daniel Kandel; Shankar Krishnan
Archive | 2004
Walter D. Mieher; Ady Levy; Boris Golovanevsky; Michael Friedmann; Ian Smith; Michael E. Adel; Anatoly Fabrikant; Christopher F. Bevis; Noah Bareket; Kenneth P. Gross; Piotr Zalicki; Dan Wack; Paola Dececco; Mark Ghinovker; Noam Knoll; Baruch Moshe
