Min Ho Jung

Top-coating composition for photoresist and process for forming fine pattern using the same

Semiconductor device using polymer-containing photoresist, and process for manufacturing the same

Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same

Reflection-inhibiting resinn used in process for forming photoresist pattern

Additive for photoresist composition for resist flow process

Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same

Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same

Photoresistzusammensetzung, die einen Photoradikalbildner und einen Photosäurebildner enthält

Resin of copolymer, its preparation and photoresist using it

A semiconductor device using a polymer-containing photoresist and process for its preparation