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Dive into the research topics where Geun Su Lee is active.

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Featured researches published by Geun Su Lee.


Advances in resist technology and processing. Conference | 2005

Studies on leaching of photoresist components by water

Seung Keun Oh; Jong Yong Kim; Young Ho Jung; Jae-Woo Lee; Deog Bae Kim; Jae-Hyun Kim; Geun Su Lee; Sung Koo Lee; Keun Do Ban; Jae Chang Jung; Cheol Kyu Bok; Seung Chan Moon

Immersion lithography has drawn tons of interests as a potential solution for sub-65nm patterning. High refractive index liquid, which is filled in the gap between exposure lens and a photoresist, can improve a resolution through increased effective numerical aperture (NA) of the exposure system. Most attractive liquid for this purpose is water. Our works were conducted as a part of the basic study for immersion lithography and aimed for the verification of leached resist components by water. It was observed that leaching relies largely on the free volume of a polymer and anion size of photoacid generator (PAG). The larger free volume and the smaller anion, the larger T-top resist profile was generated. Additionally, effects of solvents, quenchers and polarity of the polymer were investigated. Detailed results will be reported in this paper.


Archive | 2006

Hard Mask Composition and Method for Manufacturing Semiconductor Device

Geun Su Lee


Archive | 2002

Photoresist monomers, polymers thereof, and photoresist compositions containing the same

Geun Su Lee; Cha Won Koh; Jae Chang Jung; Min Ho Jung; Ki Ho Baik


Archive | 2001

Photoresist composition containing photo radical generator with photoacid generator

Jae Chang Jung; Geun Su Lee; Min Ho Jung; Ki Ho Baik


Archive | 2000

Photoresist monomer, polymer thereof and photoresist composition containing it

Min Ho Jung; Jae Chang Jung; Geun Su Lee; Ki Ho Baik


Archive | 1999

Oxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same

Jae Chang Jung; Chi Hyeong Roh; Min Ho Jung; Geun Su Lee; Ki Ho Baik


Archive | 2001

Partially crosslinked polymer for bilayer photoresist

Geun Su Lee; Jae Chang Jung; Min Ho Jung; Ki Ho Baik


Archive | 1999

Polymer and a forming method of a micro pattern using the same

Jae Chang Jung; Myoung Soo Kim; Hyung Gi Kim; Chi Hyeong Roh; Geun Su Lee; Min Ho Jung; Cheol Kyu Bok; Ki Ho Baik


Archive | 2002

Cross-linker monomer comprising double bond and photoresist copolymer containing the same

Geun Su Lee; Jae Chang Jung; Ki Ho Baik


Archive | 2002

Cleaning solution for removing photoresist

Geun Su Lee; Jae Chang Jung; Ki Soo Shin; Keun Kyu Kong; Sung Koo Lee; Young Sun Hwang

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