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Patrick Press

Advanced Micro Devices

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Publication

Featured researches published by Patrick Press.

international symposium on vlsi technology, systems, and applications | 2007

Implementation of Robust Nickel Alloy Salicide Process for High-Performance 65nm SOI CMOS Manufacturing

Jay W. Strane; David E. Brown; Christian Lavoie; Jun Suenaga; Bala Haran; Patrick Press; Paul R. Besser; Philip L. Flaitz; Michael A. Gribelyuk; Thorsten Kammler; Igor Peidous; Huajie Chen; Stephan Waidmann; Asa Frye; Patrick W. DeHaven; Anthony G. Domenicucci; Conal E. Murray; Randolph F. Knarr; H.J. Engelmann; Christof Streck; Volker Kahlert; Sadanand V. Deshpande; Effendi Leobandung; John G. Pellerin; Jaga Jagannathan

Addition of Pt to Ni silicide produces a robust [NixPt(1-x)]Si, which shows an improved morphological stability, an important reduction in encroachment defect density, a reduced tendency to form NiSi2 and significant variations in monosilicide texture without degrading the device performance or the yield of high-performance 65 nm SOI technologies.

Archive | 2006

FORMATION OF SILICIDED SURFACES FOR SILICON/CARBON SOURCE/DRAIN REGIONS

Thorsten Kammler; Patrick Press; Rolf Stephan; Sven Beyer

Archive | 2007

Semiconductor device comprising NMOS and PMOS transistors with embedded Si/Ge material for creating tensile and compressive strain

Sven Beyer; Manfred Horstmann; Patrick Press; Wolfgang Buchholtz

Archive | 2007

Transistor having a locally provided metal silicide region in contact areas and a method of forming the transistor

Sven Beyer; Patrick Press; Thomas Feudel

Microelectronic Engineering | 2006

Tuning nickel silicide properties using a lamp based RTA, a heat conduction based RTA or a furnace anneal

Stephan Waidmann; Volker Kahlert; Christof Streck; Patrick Press; Thorsten Kammler; K. Dittmar; Inka Zienert; Jochen Rinderknecht

Archive | 2007

TECHNIQUE FOR LOCALLY ADAPTING TRANSISTOR CHARACTERISTICS BY USING ADVANCED LASER/FLASH ANNEAL TECHNIQUES

Patrick Press; Karla Romero; Martin Trentzsch; Karsten Wieczorek; Thomas Feudel; Markus Lenski; Rolf Stephan

Archive | 2007

METHOD OF INCREASING TRANSISTOR PERFORMANCE BY DOPANT ACTIVATION AFTER SILICIDATION

Patrick Press; Thomas Feudel; Joe Bloomquist; Manfred Horstmann

Archive | 2006

FIELD EFFECT TRANSISTORS AND METHODS FOR FABRICATING THE SAME

Igor Peidous; Patrick Press; Rolf Stephan

Archive | 2008

Method of forming a semiconductor structure comprising an implantation of ions in a material layer to be etched

Patrick Press; Frank Wirbeleit; Joe Bloomquist; Kai Frohberg; Thomas Feudel

Archive | 2008

Halbleiterbauelement mit NMOS- und PMOS-Transistoren mit eingebettetem Si/Ge-Material zum Erzeugen einer Zugverformung und einer Druckverformung

Wolfgang Buchholtz; Sven Beyer; Manfred Horstmann; Patrick Press

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Collaboration

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Sven Beyer

GlobalFoundries

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Thomas Feudel

Advanced Micro Devices

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Rolf Stephan

Advanced Micro Devices

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Manfred Horstmann

GlobalFoundries

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Frank Wirbeleit

Advanced Micro Devices

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Joe Bloomquist

Advanced Micro Devices

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Sven Beyer

GlobalFoundries

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Karsten Wieczorek

Advanced Micro Devices

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Christof Streck

Advanced Micro Devices

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Martin Trentzsch

Advanced Micro Devices

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