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Prakash C. Dev

IBM

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Publication

Featured researches published by Prakash C. Dev.

Archive | 2001

Process for forming a damascene structure

William J. Cote; Timothy J. Dalton; Prakash C. Dev; Daniel C. Edelstein; Scott Halle; Gill Yong Lee; Arpan P. Mahorowala

Archive | 2003

Carbon-graded layer for improved adhesion of low-k dielectrics to silicon substrates

Richard A. Conti; Prakash C. Dev; David M. Dobuzinsky; Daniel C. Edelstein; Gill Yong Lee; Kia-Seng Low; Padraic Shafer; Alexander Simpson; Peter Wrschka

Archive | 2001

Modified vertical MOSFET and methods of formation thereof

Ramachandra Divakaruni; Prakash C. Dev; Rajeev Malik; Larry Alan Nesbit

Archive | 2003

Method of reducing erosion of a nitride gate cap layer during reactive ion etch of nitride liner layer for bit line contact of DRAM device

Michael Maldei; Prakash C. Dev; David M. Dobuzinsky; Johnathan E. Faltermeier; Thomas S. Rupp; Chienfan Yu; Rajesh Rengarajan; John Benedict; Munir-ud-Din Naeem

Archive | 2003

Method to improve bitline contact formation using a line mask

Michael Maldei; Johnathan E. Faltermeier; David M. Dobuzinsky; Prakash C. Dev; Thomas S. Rupp

Archive | 2004

Verfahren zur Ausbildung einer Öffnung für einen Kontakt in einem Halbleiterbauelement A method of forming an opening for a contact in a semiconductor device

John Benedict; Prakash C. Dev; David M. Dobuzinski; Johnathan E. Faltermeier; Michael Maldei; Munir-ud-Din Naeem; Rajesh Rengarajan; Thomas Dr. Rupp; Chienfan Yu

Archive | 2004

Verfahren zur Ausbildung einer Öffnung für einen Kontakt in einem Halbleiterbauelement

Chienfan Yu; Thomas S. Rupp; David M. Dobuzinski; Prakash C. Dev; Rajesh Rengarajan; Munir-ud-Din Naeem; John Benedict; Johnathan E. Faltermeier; Michael Maldei

Archive | 2004

Verfahren zur Ausbildung einer Öffnung für einen Kontakt in einem Halbleiterbauelement sowie zugehörige Halbleiterbauelementstruktur A method of forming an opening for a contact in a semiconductor device and associated semiconductor device structure

John Benedict; Prakash C. Dev; David M. Dobuzinski; Johnathan E. Faltermeier; Michael Maldei; Munir-ud-Din Naeem; Rajesh Rengarajan; Thomas Dr. Rupp; Chienfan Yu

Archive | 2004

A method of forming an opening for a contact in a semiconductor device

John Benedict; Prakash C. Dev; David M. Dobuzinski; Johnathan E. Faltermeier; Michael Maldei; Munir-ud-Din Naeem; Rajesh Rengarajan; Thomas Dr. Rupp; Chienfan Yu

Archive | 2002

Couche a concentration progressive de carbone pour accroitre l'adherence de substrats du type dielectrique a faible constante k sur silicium

Richard A. Conti; Prakash C. Dev; David M. Dobuzinsky; Daniel C. Edelstein; Gill Yong Lee; Kia-Seng Low; Padraic Shafer; Alexander Simpson; Peter Wrschka

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Chienfan Yu

IBM

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John Benedict

IBM

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Johnathan E. Faltermeier

IBM

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Munir-ud-Din Naeem

IBM

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Rajesh Rengarajan

IBM

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David M. Dobuzinski

IBM

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Daniel C. Edelstein

IBM

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David M. Dobuzinsky

IBM

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Larry Alan Nesbit

IBM

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Michael Maldei

Infineon Technologies

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