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Dive into the research topics where Rahul Jairath is active.

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Featured researches published by Rahul Jairath.


Archive | 2000

Method and apparatus for in-situ monitoring of thickness during chemical-mechanical polishing

Jiri Pecen; Saket Chadda; Rahul Jairath; Wilbur C. Krusell


Archive | 1998

Method and apparatus for in-situ monitoring of thickness using a multi-wavelength spectrometer during chemical-mechanical polishing

Jiri Pecen; John Fielden; Saket Chadda; Lloyd J. Lacomb; Rahul Jairath; Wilbur C. Krusell


Archive | 1997

Method and apparatus for in-situ end-point detection and optimization of a chemical-mechanical polishing process using a linear polisher

Rahul Jairath; Jiri Pecen; Saket Chadda; Wilbur C. Krusell; Jerauld J. Cutini; Erik H. Engdahl


Archive | 1997

Sensors for a linear polisher

Anil K. Pant; Joseph R. Breivogel; Douglas W. Young; Rahul Jairath; Erik H. Engdahl


Archive | 1998

Integrated pad and belt for chemical mechanical polishing

Anil K. Pant; Rahul Jairath; Kamal Mishra; Saket Chadda; Wilbur C. Krusell


Electrochemical and Solid State Letters | 1999

Effects of Silicon Front Surface Topography on Silicon Oxide Chemical Mechanical Planarization

C. Shan Xu; Eugene Zhao; Rahul Jairath; Willy Krusell


Archive | 2001

Method of transporting a semiconductor wafer in a wafer polishing system

Erik H. Engdahl; Edward T. Ferri; Wilbur C. Krusell; Rahul Jairath


Archive | 1998

Verfahren und Vorrichtung zum Überwachen der Dicke mit einem Mehrwellenlängen-Spektrometer in einem chemisch-mechanischen Polierverfahren

Saket Chadda; John Fielden; Rahul Jairath; Wilbur C. Krussel; Jr Lloyd J. Lacomb; Jiri Pecen


Archive | 1998

METHOD AND DEVICE MONITORING THICKNESS ON THE SPOT USING MULTIPLEX WAVE LENGTH SPECTROMETER DURING CHEMICAL AND MECHANICAL POLISHING

Saket Chadda; John Fielden; Rahul Jairath; Wilbur C. Krussel; Jr Lloyd J. Lacomb; Jiri Pecen; シー クラッセル ウィルバー; チャッダ サケット; フィールデン,ジョン; ペセン ジリ; ジャイラス ラフル; ジェイ ラコーム ジュニア ロイド


Archive | 1998

Method and device for thickness monitoring on site in chemical and mechanical polishing

Saket Chadda; Rahul Jairath; Wilbur C. Krussel; Jiri Pecen; シー クラッセル ウィルバー; チャッダ サケット; ペセン ジリ; ジャイラス ラフル

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Edward T. Ferri

MITSUBISHI MATERIALS CORPORATION

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