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Featured researches published by Saket Chadda.


Archive | 2000

Method and apparatus for in-situ monitoring of thickness during chemical-mechanical polishing

Jiri Pecen; Saket Chadda; Rahul Jairath; Wilbur C. Krusell


Archive | 1998

Method and apparatus for in-situ monitoring of thickness using a multi-wavelength spectrometer during chemical-mechanical polishing

Jiri Pecen; John Fielden; Saket Chadda; Lloyd J. Lacomb; Rahul Jairath; Wilbur C. Krusell


Archive | 1997

Method and apparatus for in-situ end-point detection and optimization of a chemical-mechanical polishing process using a linear polisher

Rahul Jairath; Jiri Pecen; Saket Chadda; Wilbur C. Krusell; Jerauld J. Cutini; Erik H. Engdahl


Archive | 1998

Integrated pad and belt for chemical mechanical polishing

Anil K. Pant; Rahul Jairath; Kamal Mishra; Saket Chadda; Wilbur C. Krusell


Archive | 1998

Verfahren und Vorrichtung zum Überwachen der Dicke mit einem Mehrwellenlängen-Spektrometer in einem chemisch-mechanischen Polierverfahren

Saket Chadda; John Fielden; Rahul Jairath; Wilbur C. Krussel; Jr Lloyd J. Lacomb; Jiri Pecen


Archive | 1998

METHOD AND DEVICE MONITORING THICKNESS ON THE SPOT USING MULTIPLEX WAVE LENGTH SPECTROMETER DURING CHEMICAL AND MECHANICAL POLISHING

Saket Chadda; John Fielden; Rahul Jairath; Wilbur C. Krussel; Jr Lloyd J. Lacomb; Jiri Pecen; シー クラッセル ウィルバー; チャッダ サケット; フィールデン,ジョン; ペセン ジリ; ジャイラス ラフル; ジェイ ラコーム ジュニア ロイド


Archive | 1998

Method and device for thickness monitoring on site in chemical and mechanical polishing

Saket Chadda; Rahul Jairath; Wilbur C. Krussel; Jiri Pecen; シー クラッセル ウィルバー; チャッダ サケット; ペセン ジリ; ジャイラス ラフル


Archive | 1998

Procédé et appareil pour la monitorage "in-situ" de l'épaisseur durant polissage chimique-mécanique

Saket Chadda; Rahul Jairaith; Wilbur C. Krusell; Jiri Pecen


Archive | 1998

Integrated pillow and belt unit for chemical mechanical polishing

K Pant; Rahul Jairath; Kamal Mishra; Saket Chadda; C Krusell


Archive | 1998

Procédé et dispositif pour la détermination in-situ du point d'arrêt et pour l'optimisation d'un procédé de polissage à polisseur linéaire

Saket Chadda; Jerauld J. Cutini; Erik H. Engdahl; Rahal Jairath; Wilbur C. Krussel; Jiri Pecen

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