Wilbur C. Krusell
Lam Research
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Publication
Featured researches published by Wilbur C. Krusell.
MRS Proceedings | 1997
E. Zhao; R. Emami; I. Malik; K. Mishra; Wilbur C. Krusell; J. de Larios; Diane J. Hymes
Double-sided brush scrubbing has become a dominant method for post-CMP cleaning applications. Chemicals delivered in-situ with brush scrubbing greatly enhance the cleaning capabilities. In this paper, the effect of dilute HF on reducing particulate defects and trace metal contamination on polished oxide surface is studied using a HF-compatible double-sided scrubber. AFM data on the interaction of dilute HF with oxide / tungsten plug array after tungsten CMP is also presented. Scrubbing with dilute HF is shown to be highly effective is removing slurry agglomerates that strongly adhere to the post-CMP oxide film.
Archive | 2000
Jiri Pecen; Saket Chadda; Rahul Jairath; Wilbur C. Krusell
Archive | 1998
Jiri Pecen; John Fielden; Saket Chadda; Lloyd J. Lacomb; Rahul Jairath; Wilbur C. Krusell
Archive | 1997
Rahul Jairath; Jiri Pecen; Saket Chadda; Wilbur C. Krusell; Jerauld J. Cutini; Erik H. Engdahl
Archive | 2000
John M. de Larios; Mike Ravkin; Glen Travis; Jim Keller; Wilbur C. Krusell
Archive | 2002
John M. de Larios; Mike Ravkin; Glen Travis; Jim Keller; Wilbur C. Krusell
Archive | 1999
Liming Zhang; Yuexing Zhao; Diane J. Hymes; Wilbur C. Krusell
Archive | 1992
Michael A. Mcneilly; John M. Delarios; Glenn L. Nobinger; Wilbur C. Krusell; Dah-Bin Kao; Ralph K. Manriquez; Chiko Fan
Archive | 2000
Wilbur C. Krusell; John M. de Larios; Mike Ravkin
Archive | 1998
Anil K. Pant; Rahul Jairath; Kamal Mishra; Saket Chadda; Wilbur C. Krusell
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