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Dive into the research topics where Ramesh Chandrasekharan is active.

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Featured researches published by Ramesh Chandrasekharan.


Archive | 2011

Plasma activated conformal film deposition

Adrien Lavoie; Shankar Swaminathan; Hu Kang; Ramesh Chandrasekharan; Tom Dorsh; Dennis M. Hausmann; Jon Henri; Thomas Jewell; Ming Li; Bryan Schlief; Antonio Xavier; Thomas W. Mountsier; Bart van Schravendijk; Easwar Srinivasan; Mandyam Sriram


Archive | 2013

DEPOSITION APPARATUS INCLUDING AN ISOTHERMAL PROCESSING ZONE

Ramesh Chandrasekharan; Jeremy Tucker; Karl Leeser; Alan M. Schoepp


Archive | 2013

Multi-plenum, dual-temperature showerhead

Ramesh Chandrasekharan; Jennifer Petraglia


Archive | 2013

SEQUENTIAL PRECURSOR DOSING IN AN ALD MULTI-STATION/BATCH REACTOR

Ramesh Chandrasekharan; Adrien Lavoie; Damien Slevin; Karl Leeser


Archive | 2012

Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region

Chunguang Xia; Ramesh Chandrasekharan; Douglas Keil; Edward Augustyniak; Karl Leeser


Archive | 2012

POINT OF USE VALVE MANIFOLD FOR SEMICONDUCTOR FABRICATION EQUIPMENT

Ramesh Chandrasekharan; Chunguang Xia; Karl Leeser; Damien Slevin; Thomas Jewell


Archive | 2015

CHEMICAL DEPOSITION CHAMBER HAVING GAS SEAL

Ramesh Chandrasekharan; Saangrut Sangplung


Archive | 2016

METHODS AND APPARATUSES FOR STABLE DEPOSITION RATE CONTROL IN LOW TEMPERATURE ALD SYSTEMS BY SHOWERHEAD ACTIVE HEATING AND/OR PEDESTAL COOLING

Chloe Baldasseroni; Adrien Lavoie; Hu Kang; Jun Qian; Purushottam Kumar; Andrew Duvall; Cody Barnett; Mohamed Sabri; Ramesh Chandrasekharan; Karl Leeser; David Charles Smith; Seshasayee Varadarajan; Edmund Minshall


Archive | 2011

GAS AND LIQUID INJECTION METHODS AND APPARATUS

Ramesh Chandrasekharan; Antonio Xavier; Kevin Jennings; Ming Li; Henri Jon; Dennis M. Hausmann


Archive | 2017

Method for depositing metals free ald silicon nitride films using halide-based precursors

James S. Sims; Jon Henri; Ramesh Chandrasekharan; Andrew John Mckerrow; Seshasayee Varadarajan; Kathryn M. Kelchner

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