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Dive into the research topics where Rashid Mavliev is active.

Publication


Featured researches published by Rashid Mavliev.


Archive | 2003

Conductive polishing article for electrochemical mechanical polishing

Paul D. Butterfield; Liang-Yuh Chen; Yongqi Hu; Antoine P. Manens; Rashid Mavliev; Stan D. Tsai; Feng Q. Liu; Ralph M. Wadensweiler; Lizhong Sun; Siew Neo; Alain Duboust


Archive | 2002

Barrier removal at low polish pressure

Stan D. Tsai; Rashid Mavliev; Lizhong Sun; Feng Q. Liu; Liang-Yuh Chen; Ratson Morad


Archive | 2002

Contacts for electrochemical processing

Paul Butterfield; Liang-Yuh Chen; Yongqi Hu; Antoine P. Manens; Rashid Mavliev; Stan D. Tsai


Archive | 2005

Single wafer dryer and drying methods

Younes Achkire; Alexander N. Lerner; Boris Govzman; Boris Fishkin; Michael Sugarman; Rashid Mavliev; Haoquan Fang; Shijian Li; Guy Shirazi; Jianshe Tang


Archive | 2004

Method and apparatus for electrochemical mechanical processing

Yan Wang; Siew Neo; Feng Liu; Stan D. Tsai; Yongqi Hu; Alain Duboust; Antoine P. Manens; Ralph M. Wadensweiler; Rashid Mavliev; Liang-Yuh Chen; Donald J. K. Olgado; Paul D. Butterfield; Ming-Kuei Tseng; Shou-sung Chang; Lizhong Sun


Archive | 2004

Endpoint system for electro-chemical mechanical polishing

Rashid Mavliev; Boguslaw A. Swedek; Andreas Norbert Wiswesser; Manoocher Birang


Archive | 2002

Control of removal profile in electrochemically assisted CMP

Lizhong Sun; Liang-Yuh Chen; Siew Neo; Feng Q. Liu; Alain Duboust; Stan D. Tsai; Rashid Mavliev


Archive | 2004

Methods and apparatus for polishing a substrate

Rashid Mavliev; Alain Duboust; Stan D. Tsai


Archive | 2006

Pad cleaning method

Rashid Mavliev; Hung Chih Chen


Archive | 2005

Conductive pad design modification for better wafer-pad contact

Rashid Mavliev; Lakshmanan Karuppiah

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