Reima Tapani Laaksonen

Tunable gate linewidth reduction process

Method of photolithographically forming extremely narrow transistor gate elements

Utilizing amorphorization of polycrystalline structures to achieve t-shaped mosfet gate

Semiconductor process using delay-compensated exposure

Silicon processing method

Stack etch method for flash memory devices

Method for manufacturing a semiconductor device using a nitrogen containing oxide layer

Formation of gate dielectrics with uniform nitrogen distribution

METHOD TO OBTAIN UNIFORM NITROGEN PROFILE IN GATE DIELECTRICS

Method for forming multi gate devices using a silicon oxide masking layer