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Dive into the research topics where Jason Garcheung Fung is active.

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Featured researches published by Jason Garcheung Fung.


advanced semiconductor manufacturing conference | 2010

Method for improved CMP pad conditioning performance

Gregory E. Menk; Sivakumar Dhandapani; Charles C. Garretson; Shou-sung Chang; Jason Garcheung Fung; Stan D. Tsai

A new pad conditioning arm design enables the use of closed-loop control (CLC) to improve conditioning performance throughout the life of a pad and disk pair. Measured pad conditioner torque is used to monitor and control the conditioning and polish processes in situ and in real time. The CLC system maintains process performance throughout pad life by adjusting the conditioner down force to compensate for process drift, such as the loss of diamond aggressiveness as the disk ages.


Archive | 2011

Closed-loop control for improved polishing pad profiles

Sivakumar Dhandapani; Jun Qian; Christopher D. Cocca; Jason Garcheung Fung; Shou-sung Chang; Charles C. Garretson; Gregory E. Menk; Stan D. Tsai


Archive | 2009

Closed-loop control for effective pad conditioning

Sivakumar Dhandapani; Stan D. Tsai; Daxin Mao; Sameer Deshpande; Shou-sung Chang; Gregory E. Menk; Charles C. Garretson; Jason Garcheung Fung; Christopher D. Cocca; Hung Chih Chen


Archive | 2011

PAD CONDITIONING FORCE MODELING TO ACHIEVE CONSTANT REMOVAL RATE

Gregory E. Menk; Stan D. Tsai; Sang J. Cho; Slvakumar Dhandapani; Christopher D. Cocca; Jason Garcheung Fung; Shou-sung Chang; Charles C. Garretson


Archive | 2011

Pad conditioning sweep torque modeling to achieve constant removal rate

Sivakumar Dhandapani; Gregory E. Menk; Sang J. Cho; Jason Garcheung Fung; Christopher D. Cocca; Stan D. Tsai; Shou-sung Chang; Charles C. Garretson


Archive | 2014

Multi-disk chemical mechanical polishing pad conditioners and methods

Hung Chen; Shou-sung Chang; Jason Garcheung Fung; Matthew A. Gallelli; Paul D. Butterfield; Kevin Chou


Archive | 2013

RETAINING RING MONITORING AND CONTROL OF PRESSURE

Hung Chih Chen; Thomas H. Osterheld; Charles C. Garretson; Jason Garcheung Fung


ECS Journal of Solid State Science and Technology | 2016

Impact of Film Morphology on Chemical Mechanical Polishing of Tungsten

Kun Xu; Shih-Haur Shen; Jason Garcheung Fung; Hassan G. Iravani; Ingemar Carlsson; Tzu-Yu Liu; Bogdan Swedek; Shou-sung Chang; Wen-chiang Tu; Tomohiko Kitajima; Katrina Mikhaylich; Brian J. Brown; Sidney P. Huey; Fritz Redeker


Archive | 2015

Chemical mechanical polishing pad with internal channels

Jason Garcheung Fung; Rajeev Bajaj; Kasiraman Krishnan; Mahendra C. Orilall; Fred C. Redeker; Russell Edward Perry; Gregory E. Menk; Daniel Redfield


Archive | 2015

Polishing pads produced by an additive manufacturing process

Rajeev Bajaj; Daniel Redfield; Mahendra C. Orilall; Boyi Fu; Aniruddh Khanna; Jason Garcheung Fung; Mario Cornejo; Ashwin Chockalingam; Mayu Yamamura; Veera Raghava Reddy Kakireddy; Ashavani Kumar; Venkatachalam Hariharan; Gregory E. Menk; Fred C. Redeker; Nag B. Patibandla; Hou T. Ng; Robert E. Davenport; Amritanshu Sinha

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