Tatsuya Yanagida

Low-emittance electron-beam generation with laser pulse shaping in photocathode radio-frequency gun

A technique of laser-pulse shaping was developed for low-emittance electron-beam generation in a photocathode radio-frequency (rf) gun. The emittance growth due to space charge and rf effects in the rf gun was experimentally investigated with square and gaussian temporal pulse shapes. It was found that the square pulse shaping was a useful tool for both the reduction of nonlinear space-charge force and the correction of linear space charge. The normalized transverse rms emittance at 1 nC was obtained to be 1.20 πmm-mrad for the square pulse shape with pulse length of 9 ps full width at half maximum. The emittance was measured as a function of the electron bunch charge and the laser-pulse length.

LPP-EUV light source development for high volume manufacturing lithography

Since 2002, we have been developing a CO2-Sn-LPP EUV light source, the most promising solution as the 13.5 nm high power (>200 W) light source for HVM EUV lithography. Because of its high efficiency, power scalability and spatial freedom around plasma, we believe that the CO2-Sn-LPP scheme is the most feasible candidate as the light source for EUVL. By now, our group has proposed several unique original technologies such as CO2 laser driven Sn plasma generation, double laser pulse shooting for higher Sn ionization rate and higher CE, Sn debris mitigation with a magnetic field, and a hybrid CO2 laser system that is a combination of a short pulse oscillator and commercial cw-CO2 amplifiers. The theoretical and experimental data have clearly demonstrated the advantage of combining a laser beam at a wavelength of the CO2 laser system with Sn plasma to achieve high CE from driver laser pulse energy to EUV in-band energy. Combination of CO2 laser power and droplet generator improvements on new EUV chamber (Proto-2) enables stable EUV emission. EUV burst operation data shows stable average 10.2W(clean power @ I/F) EUV emission and maximum 20.3W(clean power @ I/F) was demonstrated. For future HVM the maximum of 4.7% CE with a 20 μm droplet are demonstrated by ps pre-pulse LPP. Also reported 40kW CO2 laser development project cooperate with Mitsubishi electric.

Short-Pulse X-Ray Generation via Thomson Scattering in 0° and 90° Interactions

Short-pulse X-ray generation was demonstrated in a scattering experiment between a 4 ps electron beam and a 10 ps Nd:YLF laser beam. The beams interacted at 0° and 90°. The X-ray signal was measured using a microchannel plate. Maximum X-ray energy was analytically estimated to be 3.55 keV in the 0° interaction and 1.77 keV in the 90° interaction with a pulse duration of 4 ps for both interactions. Measured X-ray intensities exhibited good linearity with the incident laser light pulse energy for both scattering configurations. The measured X-ray intensity was compared with the intensity analyzed from the beam sizes and energies of both beams. The intensities matched and were of the order of 104 photons in the 0° interaction.

Experimental studies of emittance growth and energy spread in a photocathode RF gun

Abstract In this paper we report on a low emittance electron source, based on a photocathode RF gun, a solenoid magnet and a subsequent linac. The dependencies of the beam transverse emittance and relative energy spread with respect to the laser injection phase of the radio-frequency (RF) gun, the RF phase of the linac and the bunch charge were investigated experimentally. It was found that a lower beam emittance is observed when the laser injection phase in the RF gun is low. The emittance increases almost linearly with the bunch charge under a constant solenoid magnetic field. The corrected relative energy spread of the beam is not strongly dependent on the bunch charge. Finally, an optimal normalized rms transverse emittance of 1.91±0.28 πmm mrad at a bunch charge of 0.6 nC was obtained when the RF gun was driven by a picosecond Nd:YAG laser. A corrected relative rms energy spread of 0.2–0.25% at a bunch charge of 0.3– 2 nC was obtained after the beam was accelerated to 14 MeV by the subsequent linac.

Performance of one hundred watt HVM LPP-EUV source

We have been developing CO2-Sn-LPP EUV light source which is the most promising solution as the 13.5nm high power light source for HVM EUVL. Unique and original technologies such as: combination of pulsed CO2 laser and Sn droplets, dual wavelength laser pulses shooting, and mitigation with magnetic field, have been developed in Gigaphoton Inc. The theoretical and experimental data have clearly showed the advantage of our proposed strategy. Based on these data we are developing first practical source for HVM - “GL200E”. This data means 250W EUV power will be able to realize around 20kW level pulsed CO2 laser. We have reported engineering data from our recent test such around 43W average clean power, CE=2.0%, with 100kHz operation and other data 19). We have already finished preparation of higher average power CO2 laser more than 20kW at output power cooperate with Mitsubishi Electric Corporation 14). Recently we achieved 92W with 50kHz, 50% duty cycle operation 20). We have reported component technology progress of EUV light source system. We report promising experimental data and result of simulation of magnetic mitigation system in Proto #1 system. We demonstrated several data with Proto #2 system: (1) emission data of 140W in burst under 70kHz 50% duty cycle during 10 minutes. (2) emission data of 118W in burst under 60kHz 70% duty cycle during 10 minutes. (3) emission data of 42W in burst under 20kHz 50% duty cycle (10000pls/0.5ms OFF) during 3 hours (110Mpls). Also we report construction of Pilot #1 system. Final target is week level operation with 250W EUV power with CE=4%, more than 27kW CO2 laser power by the end of Q2 of 2015.

INJECTOR STUDY FOR COMPACT HARD X-RAY SOURCE VIA LASER COMPTON SCATTERING

Compact hard X-ray source via laser Compton sattering has been developed in SHI and AIST. Our system has the injector and the linac and the high power laser system. The injector has a photo-cathode rf gun with a solenoid magnet. To enhance the X-ray yeild, we are planning to increase electron beam charge up to 5 nC/bunch and to make multi-bunch beam. The beam tracking simulation in the injector have been performed by changing laser spot size, laser pulse width, rf phase and solenoid field to optimize the distance between the injector and the linac for 5 nC/bunch high charge beam. In addition, high charge multi-bunch beam simulation in rf-gun cavity have been carried out to investigate the influence by the beam loading and the wake field.

Efficient extreme ultraviolet emission from one-dimensional spherical plasmas produced by multiple lasers

We demonstrate high conversion efficiency for extreme ultraviolet (EUV) emission at 6.5–6.7 nm from multiple laser beam-produced one-dimensional spherical plasmas. Multiply charged-state ions produce strong resonance emission lines, which combine to yield intense unresolved transition arrays (UTAs) in Gd, Tb, and Mo. At an optimum laser intensity of 1 × 1012 W/cm2, which is estimated to yield an electron temperature of around 100 eV, the maximum in-band EUV conversion efficiency (CE) was observed to be 0.8%, which is one of the highest values ever reported due to the reduction of plasma expansion loss.

Development of Laser-Produced Tin Plasma-Based EUV Light Source Technology for HVM EUV Lithography

Since 2002, we have been developing a carbon dioxide (CO2) laser-produced tin (Sn) plasma (LPP) extreme ultraviolet (EUV) light source, which is the most promising solution because of the 13.5 nm wavelength high power (>200 W) light source for high volume manufacturing. EUV lithography is used for its high efficiency, power scalability, and spatial freedom around plasma. We believe that the LPP scheme is the most feasible candidate for the EUV light source for industrial use. We have several engineering data from our test tools, which include 93% Sn ionization rate, 98% Sn debris mitigation by a magnetic field, and 68% CO2 laser energy absorption rate. The way of dispersion of Sn by prepulse laser is key to improve conversion efficiency (CE). We focus on prepulsed laser pulsed duration. When we have optimized pulse duration from nanosecond to picosecond, we have obtained maximum 4.7% CE (CO2 laser to EUV; our previous data was 3.8%) at 2 mJ EUV pulse energy. Based on these data we are developing our first light source as our product: “GL200E.” The latest data and the overview of EUV light source for the industrial EUV lithography are reviewed in this paper.

CO2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography

We are developing a laser produced plasma light source for high volume manufacturing (HVM) EUV lithography. The light source is based on a high power, high repetition rate CO2 laser system, a tin target and a magnetic ion guiding for tin treatment. The laser system is a master oscillator power amplifier (MOPA) configuration. We have achieved an average laser output power of 10 kW at 100 kHz by a single laser beam with good beam quality. EUV in-band power equivalent to 60 W at intermediate focus was produced by irradiating a tin rotating plate with 6 kW laser power. This light source is scalable to more than 200 W EUV in-band power based on a 20-kW CO2 laser. Collector mirror life can be extended by using droplet target and magnetic ion guiding. Effectiveness of the magnetic ion guiding is examined by monitoring the motion of fast Sn ion in a large vacuum chamber with a maximum magnetic flux density of 2 T.

Performance of new high-power HVM LPP-EUV source

We have been developing CO2-Sn-LPP EUV light source which is the most promising solution as the 13.5nm high power light source for HVM EUVL since 2003. Unique original technologies such as; combination of pulsed CO2 laser and Sn droplets, dual wavelength laser pulse shooting and mitigation with magnetic field have been developed in Gigaphoton Inc.. The theoretical and experimental data have clearly showed the advantage of our proposed strategy. We demonstrated 108W EUV power (I/F clean in burst), 80 kHz, 24 hours stable operation at Proto#2 device. Based on these experimental data we are now constructing first practical source for HVM; “GL200E-Pilot#1”. Target of this device is 250 W EUV power by 27 kW pulsed CO2 driver laser system.