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Thomas Graves

Applied Materials

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Publication

Featured researches published by Thomas Graves.

Archive | 2008

Method of coating semiconductor processing apparatus with protective yttrium-containing coatings

Jennifer Y. Sun; Shun Jackson Wu; Senh Thach; Ananda H. Kumar; Robert W. Wu; Hong Wang; Yixing Lin; Clifford C. Stow; Jim Dempster; Li Xu; Kenneth S. Collins; Ren-Guan Duan; Thomas Graves; Xiaoming He; Jie Yuan

Archive | 2009

Ceramic coating comprising yttrium which is resistant to a reducing plasma

Jennifer Y. Sun; Xiaoming He; Kenneth S. Collins; Thomas Graves; Senh Thach; Jie Yuan; Li Xu; Ren-Guan Duan

Archive | 2007

Plasma-resistant ceramics with controlled electrical resistivity

Jennifer Y. Sun; Kenneth S. Collins; Ren-Guan Duan; Senh Thach; Thomas Graves; Xiaoming He; Jie Yuan

Archive | 2011

Gas distribution showerhead with coating material for semiconductor processing

Jennifer Y. Sun; Senh Thach; Ren-Guan Duan; Thomas Graves

Archive | 2012

Method of producing a plasma-resistant thermal oxide coating

Jennifer Y. Sun; Li Xu; Kenneth S. Collins; Thomas Graves; Ren-Guan Duan; Senh Thach

Archive | 2008

Erosion resistant yttrium comprising metal with oxidized coating for plasma chamber components

Jennifer Y. Sun; Li Xu; Kenneth S. Collins; Thomas Graves; Ren-Guan Duan; Senh Thach

Archive | 2007

Erosion-resistant plasma chamber components comprising a metal base structure with an overlying thermal oxidation coating

Jennifer Y. Sun; Li Xu; Kenneth S. Collins; Thomas Graves; Ren-Guan Duan; Senh Thach

Archive | 2007

Chemical treatment to reduce machining-induced sub-surface damage in semiconductor processing components comprising silicon carbide

Jennifer Y. Sun; Irene A. Chou; Li Xu; Kenneth S. Collins; Thomas Graves

Archive | 2007

Plasma-proof ceramics equipped with controlled electric resistivity

Kenneth S. Collins; Ren-Guan Duan; Thomas Graves; Xiaoming He; Jennifer Y. Sun; Senh Thach; Jie Yuan; エス コリンズ ケニス; ユアン ジエ; ワイ サン ジェニファー; ヒー シャオミング; サッチ センハ; グレーブス トーマス; デュアン レングアン

Archive | 2012

Method of reducing plasma arcing on surfaces of semiconductor processing apparatus components in a plasma processing chamber

Jennifer Y. Sun; Kenneth S. Collins; Ren-Guan Duan; Senh Thach; Thomas Graves; Xiaoming He; Jie Yuan

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Collaboration

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Jennifer Y. Sun

Applied Materials

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Ren-Guan Duan

Applied Materials

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Kenneth S. Collins

Applied Materials

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Senh Thach

Applied Materials

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Li Xu

Applied Materials

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Jie Yuan

Applied Materials

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Xiaoming He

Applied Materials

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Ananda H. Kumar

Applied Materials

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Clifford C. Stow

Applied Materials

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Hong Wang

Applied Materials

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