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Tsuyoshi Horikawa

Mitsubishi

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Publication

Featured researches published by Tsuyoshi Horikawa.

Archive | 1997

High dielectric constant thin film structure, method for forming high dielectric constant thin film and apparatus for forming high dielectric constant thin film

Takaaki Kawahara; Mikio Yamamuka; Tetsuro Makita; Tsuyoshi Horikawa; Akimasa Yuuki; Teruo Shibano

Archive | 2001

Chemical vapor deposition apparatus and a method of manufacturing a semiconductor device

Mikio Yamamuka; Takaaki Kawahara; Masayoshi Tarutani; Tsuyoshi Horikawa; Shigeru Matsuno; Takehiko Sato

Archive | 1999

Vaporizer for chemical vapor deposition apparatus, chemical vapor deposition apparatus, and semiconductor device manufactured thereby

Masayoshi Tarutani; Tsuyoshi Horikawa; Takaaki Kawahara; Mikio Yamamuka; Shigeru Matsuno; Takehiko Sato

Archive | 1998

CVD apparatus for forming thin film having high dielectric constant

Masayoshi Tarutani; Tsuyoshi Horikawa; Takaaki Kawahara; Mikio Yamamuka

Archive | 1996

Semiconductor device which includes a capacitor having a lower electrode formed of iridium or ruthenium

Takeharu Kuroiwa; Tsuyoshi Horikawa; Tetsuro Makita; Noboru Mikami; Teruo Shibano

Archive | 2001

Method of forming high dielectric constant thin film and method of manufacturing semiconductor device

Takaaki Kawahara; Mikio Yamamuka; Tsuyoshi Horikawa; Masayoshi Tarutani; Takehiko Sato; Shigeru Matsuno

Archive | 1992

Optical writing type liquid crystal light valve and writing apparatus therefor

Kazuro Nishi; Hajime Nakajima; Masaya Mizunuma; Tatsuo Masumi; Shigeyuki Kaho; Tsuyoshi Horikawa; Shin Tahata

Archive | 1998

Semiconductor memory device and method for producing the same

Takeharu Kuroiwa; Tsuyoshi Horikawa; Noboru Mikami; Tetsuro Makita

Archive | 1997

Semiconductor device with x-ray absorption layer

Tsuyoshi Horikawa; Yoshikazu Tsunemine; Takeharu Kuroiwa; Tetsuro Makita; Noboru Mikami

Archive | 2003

Liquid material for chemical vapor deposition, method of forming film by chemical vapor deposition and chemical vapor deposition apparatus

Tsuyoshi Horikawa

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Collaboration

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Takaaki Kawahara

Mitsubishi

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Mikio Yamamuka

Mitsubishi

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Masayoshi Tarutani

Mitsubishi

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Tetsuro Makita

Mitsubishi

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Noboru Mikami

Mitsubishi

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Takeharu Kuroiwa

Mitsubishi

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Shigeru Matsuno

Mitsubishi

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Takehiko Sato

Mitsubishi

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Teruo Shibano

Mitsubishi

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Akihiko Furukawa

Mitsubishi

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