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Xiaoye Zhao

Applied Materials

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Publication

Featured researches published by Xiaoye Zhao.

Archive | 2001

MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression

Daniel J. Hoffman; Yan Ye; Dan Katz; Douglas A. Buchberger; Xiaoye Zhao; Kang-Lie Chiang; Robert B. Hagen; Matthew L. Miller

Archive | 2006

Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone

Kallol Bera; Xiaoye Zhao; Kenny L. Doan; Ezra Robert Gold; Paul Brillhart; Bruno Geoffrion; Bryan Pu; Daniel J. Hoffman

Archive | 2006

Chamber recovery after opening barrier over copper

Hairong Tang; Xiaoye Zhao; Keiji Horioka

Archive | 2001

Gas distribution plate electrode for a plasma reactor

Dan Katz; Douglas A. Buchberger; Yan Ye; Robert B. Hagen; Xiaoye Zhao; Ananda H. Kumar; Kang-Lie Chiang; Hamid Noorbakhsh; Shiang-Bau Wang

Archive | 2003

Method for modifying dielectric characteristics of dielectric layers

Kang-Lie Chiang; Mahmoud Dahimene; Xiaoye Zhao; Yan Ye; Gerardo A. Delgadino; Hoiman Hung; Li-Qun Xia; Giuseppina Conti

Archive | 2006

Selective etch process of a sacrificial light absorbing material (slam) over a dielectric material

Hee Yeop Chae; Gerardo A. Delgadino; Xiaoye Zhao; Yan Ye

Archive | 2006

Method to reduce plasma-induced charging damage

Michael C. Kutney; Daniel J. Hoffman; Gerardo A. Delgadino; Ezra Robert Gold; Ashok K. Sinha; Xiaoye Zhao; Douglas H. Burns; Shawming Ma

Archive | 2006

Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas content

Kallol Bera; Xiaoye Zhao; Kenny L. Doan; Ezra Robert Gold; Paul Brillhart; Bruno Geoffrion; Bryan Pu; Daniel J. Hoffman

Archive | 2006

Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation

Kallol Bera; Xiaoye Zhao; Kenny L. Doan; Ezra Robert Gold; Paul Brillhart; Bruno Geoffrion; Bryan Pu; Daniel J. Hoffman

Archive | 2006

Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones

Kallol Bera; Xiaoye Zhao; Kenny L. Doan; Ezra Robert Gold; Paul Brillhart; Bruno Geoffrion; Bryan Pu; Daniel J. Hoffman

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Collaboration

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Daniel J. Hoffman

Applied Materials

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Yan Ye

Applied Materials

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Ezra Robert Gold

Applied Materials

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Bruno Geoffrion

Applied Materials

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Bryan Pu

Applied Materials

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Gerardo A. Delgadino

Applied Materials

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Kallol Bera

Applied Materials

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Kang-Lie Chiang

Applied Materials

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Kenny L. Doan

Applied Materials

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Paul Brillhart

Applied Materials

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