Is this you? Create Your Porfile
Avatar

Bruno Geoffrion

Applied Materials

Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Explore More

Hotspot

Dive into the research topics where Bruno Geoffrion is active.

Explore More

Publication

Featured researches published by Bruno Geoffrion.

Archive | 2006

Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone

Kallol Bera; Xiaoye Zhao; Kenny L. Doan; Ezra Robert Gold; Paul Brillhart; Bruno Geoffrion; Bryan Pu; Daniel J. Hoffman

Archive | 2007

Method and apparatus for controlling gas flow to a processing chamber

Ezra Robert Gold; Richard Fovell; James P. Cruse; Jared Ahmad Lee; Bruno Geoffrion; Douglas A. Buchberger; Martin Jeff Salinas

Archive | 2004

Method for high aspect ratio HDP CVD gapfill

Zhong Qiang Hua; Dong Qing Li; Zhengquan Tan; Zhuang Li; Michael Chiu Kwan; Bruno Geoffrion; Padmanabhan Krishnaraj

Archive | 2006

Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas content

Kallol Bera; Xiaoye Zhao; Kenny L. Doan; Ezra Robert Gold; Paul Brillhart; Bruno Geoffrion; Bryan Pu; Daniel J. Hoffman

Archive | 2006

Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation

Kallol Bera; Xiaoye Zhao; Kenny L. Doan; Ezra Robert Gold; Paul Brillhart; Bruno Geoffrion; Bryan Pu; Daniel J. Hoffman

Archive | 2006

Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones

Kallol Bera; Xiaoye Zhao; Kenny L. Doan; Ezra Robert Gold; Paul Brillhart; Bruno Geoffrion; Bryan Pu; Daniel J. Hoffman

Archive | 2006

Plasma etch process using polymerizing etch gases and an inert diluent gas in independent gas injection zones to improve etch profile or etch rate uniformity

Kallol Bera; Xiaoye Zhao; Kenny L. Doan; Ezra Robert Gold; Paul Brillhart; Bruno Geoffrion; Bryan Pu; Daniel J. Hoffman

Archive | 2005

Gas distribution system for improved transient phase deposition

Sudhir Gondhalekar; Robert Duncan; Siamak Salimian; Muhammad Rasheed; Harry Whitesell; Bruno Geoffrion; Padmanabhan Krishnaraj; Rudolf Gujer

Archive | 2006

System and method to divide fluid flow in a predetermined ratio

Bruno Geoffrion; Mark Adam Crocket

Archive | 2005

Use of germanium dioxide and/or alloys of GeO2 with silicon dioxide for semiconductor dielectric applications

Padmanabhan Krishnaraj; Michael S. Cox; Bruno Geoffrion; Srinivas D. Nemani

Explore More

Collaboration

Dive into the Bruno Geoffrion's collaboration.

Top Co-Authors
Avatar

Ezra Robert Gold

Applied Materials

View shared research outputs
Top Co-Authors
Avatar

Bryan Pu

Applied Materials

View shared research outputs
Top Co-Authors
Avatar

Daniel J. Hoffman

Applied Materials

View shared research outputs
Top Co-Authors
Avatar

James P. Cruse

Applied Materials

View shared research outputs
Top Co-Authors
Avatar

Jared Ahmad Lee

Applied Materials

View shared research outputs
Top Co-Authors
Avatar

Kallol Bera

Applied Materials

View shared research outputs
Top Co-Authors
Avatar

Kenny L. Doan

Applied Materials

View shared research outputs
Top Co-Authors
Avatar

Paul Brillhart

Applied Materials

View shared research outputs
Top Co-Authors
Avatar

Richard Fovell

Applied Materials

View shared research outputs
Top Co-Authors
Avatar

Xiaoye Zhao

Applied Materials

View shared research outputs
Explore More
Researchain Logo
Decentralizing Knowledge