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Charles C. Garretson

Applied Materials

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Featured researches published by Charles C. Garretson.

advanced semiconductor manufacturing conference | 2010

Method for improved CMP pad conditioning performance

Gregory E. Menk; Sivakumar Dhandapani; Charles C. Garretson; Shou-sung Chang; Jason Garcheung Fung; Stan D. Tsai

A new pad conditioning arm design enables the use of closed-loop control (CLC) to improve conditioning performance throughout the life of a pad and disk pair. Measured pad conditioner torque is used to monitor and control the conditioning and polish processes in situ and in real time. The CLC system maintains process performance throughout pad life by adjusting the conditioner down force to compensate for process drift, such as the loss of diamond aggressiveness as the disk ages.

Archive | 1998

Method of post CMP defect stability improvement

Boris Fishkin; Charles C. Garretson; Peter McKeever; Thomas H. Osterheld; Gopalakrishna B. Prabhu; Doyle E. Bennett; Benjamin A. Bonner; Sidney P. Huey

Archive | 2004

Retaining ring with shaped surface

Hung Chih Chen; Steven M. Zuniga; Charles C. Garretson; Douglas R. Mcallister; Jian Lin; Stacy Meyer; Sidney P. Huey; Jeonghoon Oh; Trung T. Doan; Jeffrey Schmidt; Martin S. Wohlert; Kerry F. Hughes; James C. Wang; Daniel Cam Toan Lu; Romain Beau De Lamenie; Venkata R. Balagani; Aden Martin Allen; Michael Jon Fong

Archive | 2000

Pad conditioning disk

Charles C. Garretson

Archive | 2000

Chemical mechanical polishing pad conditioning element with discrete points and compliant membrane

Thomas H. Osterheld; Manoocher Birang; Robert D. Tolles; Steven M. Zuniga; Charles C. Garretson

Archive | 2010

Feedback for polishing rate correction in chemical mechanical polishing

Jun Qian; Charles C. Garretson; Sivakumar Dhandapani; Jeffrey Drue David; Harry Q. Lee

Archive | 2005

Profile control platen

Hung Chih Chen; Steven M. Zuniga; Charles C. Garretson; Thomas H. Osterheld; Sen-Hou Ko; Mohsen Salek

Archive | 2000

Method and apparatus for measuring a pad profile and closed loop control of a pad conditioning process

Dominic J. Benvegnu; Charles C. Garretson

Archive | 2000

Carrier head with a modified flexible membrane

Jianshe Tang; Brian J. Brown; Charles C. Garretson; Benjamine.A Bonner; Thomas H. Osterheld; Fred C. Redeker

Archive | 2011

Closed-loop control for improved polishing pad profiles

Sivakumar Dhandapani; Jun Qian; Christopher D. Cocca; Jason Garcheung Fung; Shou-sung Chang; Charles C. Garretson; Gregory E. Menk; Stan D. Tsai

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Sivakumar Dhandapani

Applied Materials

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Thomas H. Osterheld

Applied Materials

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Gregory E. Menk

Applied Materials

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Hung Chih Chen

Applied Materials

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Steven M. Zuniga

Applied Materials

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Jeonghoon Oh

Applied Materials

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Sidney P. Huey

Applied Materials

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Stan D. Tsai

Applied Materials

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Aden Martin Allen

Applied Materials

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Douglas R. Mcallister

Applied Materials

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