Charles C. Garretson
Applied Materials
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Featured researches published by Charles C. Garretson.
advanced semiconductor manufacturing conference | 2010
Gregory E. Menk; Sivakumar Dhandapani; Charles C. Garretson; Shou-sung Chang; Jason Garcheung Fung; Stan D. Tsai
A new pad conditioning arm design enables the use of closed-loop control (CLC) to improve conditioning performance throughout the life of a pad and disk pair. Measured pad conditioner torque is used to monitor and control the conditioning and polish processes in situ and in real time. The CLC system maintains process performance throughout pad life by adjusting the conditioner down force to compensate for process drift, such as the loss of diamond aggressiveness as the disk ages.
Archive | 1998
Boris Fishkin; Charles C. Garretson; Peter McKeever; Thomas H. Osterheld; Gopalakrishna B. Prabhu; Doyle E. Bennett; Benjamin A. Bonner; Sidney P. Huey
Archive | 2004
Hung Chih Chen; Steven M. Zuniga; Charles C. Garretson; Douglas R. Mcallister; Jian Lin; Stacy Meyer; Sidney P. Huey; Jeonghoon Oh; Trung T. Doan; Jeffrey Schmidt; Martin S. Wohlert; Kerry F. Hughes; James C. Wang; Daniel Cam Toan Lu; Romain Beau De Lamenie; Venkata R. Balagani; Aden Martin Allen; Michael Jon Fong
Archive | 2000
Charles C. Garretson
Archive | 2000
Thomas H. Osterheld; Manoocher Birang; Robert D. Tolles; Steven M. Zuniga; Charles C. Garretson
Archive | 2010
Jun Qian; Charles C. Garretson; Sivakumar Dhandapani; Jeffrey Drue David; Harry Q. Lee
Archive | 2005
Hung Chih Chen; Steven M. Zuniga; Charles C. Garretson; Thomas H. Osterheld; Sen-Hou Ko; Mohsen Salek
Archive | 2000
Dominic J. Benvegnu; Charles C. Garretson
Archive | 2000
Jianshe Tang; Brian J. Brown; Charles C. Garretson; Benjamine.A Bonner; Thomas H. Osterheld; Fred C. Redeker
Archive | 2011
Sivakumar Dhandapani; Jun Qian; Christopher D. Cocca; Jason Garcheung Fung; Shou-sung Chang; Charles C. Garretson; Gregory E. Menk; Stan D. Tsai