Gregory E. Menk
Applied Materials
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Publication
Featured researches published by Gregory E. Menk.
advanced semiconductor manufacturing conference | 2010
Gregory E. Menk; Sivakumar Dhandapani; Charles C. Garretson; Shou-sung Chang; Jason Garcheung Fung; Stan D. Tsai
A new pad conditioning arm design enables the use of closed-loop control (CLC) to improve conditioning performance throughout the life of a pad and disk pair. Measured pad conditioner torque is used to monitor and control the conditioning and polish processes in situ and in real time. The CLC system maintains process performance throughout pad life by adjusting the conditioner down force to compensate for process drift, such as the loss of diamond aggressiveness as the disk ages.
Archive | 2003
Gopalakrishna B. Prabhu; Thomas H. Osterheld; Garlen C. Leung; Adam H. Zhong; Peter McReynolds; Yi-Yung Tao; Gregory E. Menk; Vasanth N. Mohan; Christopher Heung-Gyun Lee
Archive | 2002
Halbert Tam; Gregory E. Menk
Archive | 2007
Gregory E. Menk; Peter McReynolds; Erik S. Rondum; Anand N. Iyer; Gopalakrishna B. Prabhu; Garlen C. Leung
Archive | 2007
Steven M. Zuniga; Peter McReynolds; Erik S. Rondum; Benjamin A. Bonner; Henry H. Au; Gregory E. Menk; Gopalakrishna B. Prabhu; Anand N. Iyer; Garlen C. Leung
Archive | 2011
Sivakumar Dhandapani; Jun Qian; Christopher D. Cocca; Jason Garcheung Fung; Shou-sung Chang; Charles C. Garretson; Gregory E. Menk; Stan D. Tsai
Archive | 2009
Sivakumar Dhandapani; Stan D. Tsai; Daxin Mao; Sameer Deshpande; Shou-sung Chang; Gregory E. Menk; Charles C. Garretson; Jason Garcheung Fung; Christopher D. Cocca; Hung Chih Chen
Archive | 2008
Robert A. Marks; Christopher Heung-Gyun Lee; Garlen C. Leung; Gregory E. Menk; Jie Diao; Erik S. Rondum
Archive | 2008
Gopalakrishna B. Prabhu; Yin Yuan; Jeonghoon Oh; Gregory E. Menk
Archive | 2007
Gregory E. Menk; Robert L. Jackson; Garlen C. Leung; Gopalakrishna B. Prabhu; Peter McReynolds; Anand N. Iyer
