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Chiu Chan

Applied Materials

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Publication

Featured researches published by Chiu Chan.

Archive | 2007

Method for depositing an amorphous carbon film with improved density and step coverage

Deenesh Padhi; Hyoung-Chan Ha; Sudha Rathi; Derek R. Wtty; Chiu Chan; Sohyun Park; Ganesh Balasubramanian; Karthik Janakiraman; Martin Jay Seamons; Visweswaren Sivaramakrishnan; Bok Hoen Kim; Hichem M'Saad

Archive | 2008

Systems for plasma enhanced chemical vapor deposition and bevel edge etching

Ashish Shah; Dale R. DuBois; Ganesh Balasubramanian; Mark Fodor; Eui Kyoon Kim; Chiu Chan; Karthik Janakiraman; Thomas Nowak; Joseph C. Werner; Visweswaren Sivaramakrishnan; Mohamad A. Ayoub; Amir Al-Bayati; Jianhua Zhou

Archive | 2011

Ultra high selectivity ashable hard mask film

Kwangduk Douglas Lee; Martin Jay Seamons; Sudha Rathi; Chiu Chan; Michael H. Lin

Archive | 2007

Methods to improve the in-film defectivity of pecvd amorphous carbon films

Deenesh Padhi; Chiu Chan; Sudha Rathi; Ganesh Balasubramanian; Jianhua Zhou; Karthik Janakiraman; Martin Jay Seamons; Visweswaren Sivaramakrishnan; Hichem M'Saad

Archive | 2010

Shadow ring for modifying wafer edge and bevel deposition

Dale R. Du Bois; Mohamad A. Ayoub; Robert Kim; Amit Kumar Bansal; Mark Fodor; Binh Nguyen; Siu F. Cheng; Hang Yu; Chiu Chan; Ganesh Balasubramanian; Deenesh Padhi; Juan Carlos Rocha

Archive | 2011

Ultra high selectivity doped amorphous carbon strippable hardmask development and integration

Martin Jay Seamons; Sudha Rathi; Kwangduk Douglas Lee; Deenesh Padhi; Bok Hoen Kim; Chiu Chan

Archive | 2011

METHODS OF REMOVING A MATERIAL LAYER FROM A SUBSTRATE USING WATER VAPOR TREATMENT

Kwangduk Douglas Lee; Sudha Rathi; Chiu Chan; Martin Jay Seamons; Bok Heon Kim

Archive | 2010

PLANARIZING ETCH HARDMASK TO INCREASE PATTERN DENSITY AND ASPECT RATIO

Martin Jay Seamons; Kwangduk Douglas Lee; Chiu Chan; Patrick Reilly; Sudha Rathi

Archive | 2008

Apparatus and method for centering a substrate in a process chamber

Dale R. Du Bois; Ganesh Balasubramanian; Mark Fodor; Chiu Chan; Karthik Janakiraman

Archive | 2007

Apparatus and method for substrate clamping in a plasma chamber

Ganesh Balasubramanian; Amit Kumar Bansal; Eller Y. Juco; Mohamad A. Ayoub; Hyung-Joon Kim; Karthik Janakiraman; Sudha Rathi; Deenesh Padhi; Martin Jay Seamons; Visweswaren Sivaramakrishnan; Bok Hoen Kim; Amir Al-Bayati; Hichem M'Saad; Anton Baryshnikov; Chiu Chan; Shuang Liu

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Martin Jay Seamons

Applied Materials

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Sudha Rathi

Applied Materials

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Ganesh Balasubramanian

Applied Materials

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Deenesh Padhi

Applied Materials

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Karthik Janakiraman

Applied Materials

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Visweswaren Sivaramakrishnan

Applied Materials

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Bok Hoen Kim

Applied Materials

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Hichem M'Saad

Applied Materials

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Kwangduk Douglas Lee

Applied Materials

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Mohamad A. Ayoub

Applied Materials

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