Christian Wald | Researchain

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Featured researches published by Christian Wald.

Archive | 2014

Projection Lens for EUV Microlithography, Film Element and Method for Producing a Projection Lens Comprising a Film Element

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Christian Wald; Rumen Iliew; Thomas Schicketanz; Toralf Gruner; Walter Pauls; Holger Schmidt

Archive | 2013

METHOD OF OPERATING A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY

Olaf Conradi; Michael Totzeck; Ulrich Loering; Dirk Juergens; Ralf Mueller; Christian Wald

Archive | 2013

Projektionsobjektiv für EUV-Mikrolithographie, Folienelement und Verfahren zur Herstellung eines Projektionsobjektivs mit Folienelement

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Christian Wald; Rumen Iliew; Thomas Schicketanz; Toralf Gruner

Archive | 2014

Method for manufacturing blank for manufacturing mirror, involves determining location-dependent varying distribution of zero crossing temperature in volume of blank, based on three-dimensional profile of temperature distribution

Boris Bittner; Christian Wald; Hendrik Wagner; Norbert Wabra; Steffen Fritzsche; Sonja Schneider; Ricarda Schneider; Holger Schmidt; Walter Pauls; Florian Ahles

Archive | 2016

MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM AND METHOD FOR PROCESSING A MIRROR

Karl-Heinz Schuster; Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Christian Wald; Walter Pauls; Holger Schmidt

Archive | 2015

Optical Waveguide for Guiding Illumination Light

Christian Wald; Stefan Schaff; Markus Deguenther; Daniel Runde

Archive | 2013

Arrangement structure for extreme UV (EUV) projection exposure system, has gas flow supply unit that is provided to supply flow of gas through optic element, such that heat exchange takes place between optic element and flow of gas

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Christian Wald; Walter Pauls; Holger Schmidt

Archive | 2013

Projection arrangement for e.g. extreme UV lithography device used for manufacture of e.g. integrated electric circuit, has manipulator which receives signal used for converting transmitted energy into objective form of energy

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Christian Wald; Walter Pauls; Holger Schmidt; Florian Ahles; Steffen Fritzsche

Archive | 2011