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Norbert Wabra

Carl Zeiss AG

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Publication

Featured researches published by Norbert Wabra.

Archive | 2005

Projection objective for a microlithographic projection exposure apparatus

Bernhard Kneer; Norbert Wabra; Toralf Gruner; Alexander Epple; Susanne Beder; Wolfgang Singer

Archive | 2005

Exposure apparatus and measuring device for a projection lens

Albrecht Ehrmann; Ulrich Wegmann; Rainer Hoch; Joerg Mallmann; Karl-Heinz Schuster; Ulrich Loering; Toralf Gruner; Bernhard Kneer; Bernhard Geuppert; Franz Sorg; Jens Kugler; Norbert Wabra

Archive | 2005

Projection lens system of a microlithographic projection exposure installation

Helmut Beierl; Sascha Bleidistel; Wolfgang Singer; Toralf Gruner; Alexander Epple; Norbert Wabra; Susanne Beder; Jochen Weber; Heiko Feldmann; Baerbel Schwaer; Olaf Rogalsky; Arif Kazi

Archive | 2008

Microlithographic projection exposure apparatus and measuring device for a projection lens

Albrecht Ehrmann; Ulrich Wegmann; Rainer Hoch; Joerg Mallmann; Karl-Heinz Schuster; Ulrich Loering; Toralf Gruner; Bernhard Kneer; Bernhard Geuppert; Franz Sorg; Jens Kugler; Norbert Wabra

Archive | 2012

Method for correcting a lithography projection objective, and such a projection objective

Wilhelm Ulrich; Thomas Okon; Norbert Wabra; Toralf Gruner; Boris Bittner; Volker Graeschus

Archive | 2013

Reflektives optisches Element für den EUV-Wellenlängenbereich, Verfahren zur Erzeugung und zur Korrektur eines solchen Elements, Projektionsobjektiv für die Mikrolithographie mit einem solchen Element und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv

Markus Weiss; Norbert Kerwien; Martin Weiser; Boris Bittner; Norbert Wabra; Christoph Schlichenmaier; Wilfried Clauss

Archive | 2014

Projection Lens for EUV Microlithography, Film Element and Method for Producing a Projection Lens Comprising a Film Element

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Christian Wald; Rumen Iliew; Thomas Schicketanz; Toralf Gruner; Walter Pauls; Holger Schmidt

Archive | 2014

Cooling system for e.g. collector mirrors, of EUV projection exposure system for lithographic manufacturing of semiconductor component, has cooling passage receiving heat from system components and discharging received heat

Stacy Figueredo; Erik Roelof Loopstra; Sonja Schneider; Markus Hauf; Boris Bittner; Norbert Wabra; Ricarda Schneider; Holger Schmidt

Archive | 2014

Spiegelanordnung für eine EUV-Projektionsbelichtungsanlage, Verfahren zum Betreiben derselben, sowie EUV-Projektionsbelichtungsanlage

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Rumen Iliew; Walter Pauls

Archive | 2013

Mirror arrangement for an euv projection exposure apparatus, method for operating the same, and euv projection exposure apparatus

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Rumen Iliew; Walter Pauls

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Boris Bittner

Carl Zeiss AG

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Sonja Schneider

Carl Zeiss AG

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Ricarda Schneider

Carl Zeiss AG

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Hendrik Wagner

Carl Zeiss AG

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Holger Schmidt

Carl Zeiss AG

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Walter Pauls

Carl Zeiss AG

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Christian Wald

Carl Zeiss AG

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Martin von Hodenberg

Carl Zeiss AG

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Rumen Iliew

Carl Zeiss AG

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Toralf Gruner

Carl Zeiss AG

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