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Dive into the research topics where Steffen Fritzsche is active.

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Featured researches published by Steffen Fritzsche.


Archive | 2003

Pre adjustment process for projection system for EUV lithography for microelectronics or microscopy uses pre adjusting wavelength differing from final wavelength

Steffen Fritzsche; Hans-Jürgen Mann; Erik Sohmen


Archive | 2014

Method for manufacturing blank for manufacturing mirror, involves determining location-dependent varying distribution of zero crossing temperature in volume of blank, based on three-dimensional profile of temperature distribution

Boris Bittner; Christian Wald; Hendrik Wagner; Norbert Wabra; Steffen Fritzsche; Sonja Schneider; Ricarda Schneider; Holger Schmidt; Walter Pauls; Florian Ahles


Archive | 2013

Projection arrangement for e.g. extreme UV lithography device used for manufacture of e.g. integrated electric circuit, has manipulator which receives signal used for converting transmitted energy into objective form of energy

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Christian Wald; Walter Pauls; Holger Schmidt; Florian Ahles; Steffen Fritzsche


Archive | 2015

Verfahren zum Herstellen eines Rohlings

Boris Bittner; Christian Wald; Hendrik Wagner; Norbert Wabra; Steffen Fritzsche; Sonja Schneider; Ricarda Schneider; Holger Schmidt; Walter Pauls; Florian Ahles


Archive | 2015

Thermisch optimierte obskurationsblenden und projektionsbelichtungsanlage mit derartigen blenden Thermally optimized obskurationsblenden and projection exposure system with such dazzle

Walter Pauls; Hendrik Wagner; Florian Ahles; Steffen Fritzsche; Christian Wald


Archive | 2014

Mikrostrukturierter Sprektralfilter für EUV-Anwendungen

Walter Pauls; Christian Wald; Hendrik Wagner; Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Holger Schmidt; Alexey Ponomarev; Steffen Fritzsche


Archive | 2014

Optisches element, projektionsanordnung, und verfahren zum herstellen eines optischen elements Optical element, the projection arrangement, and method for manufacturing an optical element

Florian Ahles; Boris Bittner; Steffen Fritzsche; Norbert Wabra; Hendrik Wagner


Archive | 2013

Apparatus and method for reducing contamination of a reticle and / or wafer in an optical system

Florian Ahles; Steffen Fritzsche; Walter Pauls; Hendrik Wagner; Christian Wald


Archive | 2013

Optikanordnung Optics assembly

Walter Pauls; Hendrik Wagner; Florian Ahles; Christian Wald; Steffen Fritzsche; Norbert Wabra; Boris Bittner; Sonja Schneider; Ricarda Schneider


Archive | 2013

Vorrichtung und Verfahren zur Reduzierung von Kontaminationen eines Retikels und/oder eines Wafers in einem optischen System An apparatus and method for reducing contamination of a reticle and / or wafer in an optical system

Florian Ahles; Steffen Fritzsche; Walter Pauls; Hendrik Wagner; Christian Wald

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