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Ricarda Schneider

Carl Zeiss AG

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Publication

Featured researches published by Ricarda Schneider.

Archive | 2014

Projection Lens for EUV Microlithography, Film Element and Method for Producing a Projection Lens Comprising a Film Element

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Christian Wald; Rumen Iliew; Thomas Schicketanz; Toralf Gruner; Walter Pauls; Holger Schmidt

Archive | 2014

Cooling system for e.g. collector mirrors, of EUV projection exposure system for lithographic manufacturing of semiconductor component, has cooling passage receiving heat from system components and discharging received heat

Stacy Figueredo; Erik Roelof Loopstra; Sonja Schneider; Markus Hauf; Boris Bittner; Norbert Wabra; Ricarda Schneider; Holger Schmidt

Archive | 2014

Spiegelanordnung für eine EUV-Projektionsbelichtungsanlage, Verfahren zum Betreiben derselben, sowie EUV-Projektionsbelichtungsanlage

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Rumen Iliew; Walter Pauls

Archive | 2013

Mirror arrangement for an euv projection exposure apparatus, method for operating the same, and euv projection exposure apparatus

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Rumen Iliew; Walter Pauls

Archive | 2013

Projektionsobjektiv für EUV-Mikrolithographie, Folienelement und Verfahren zur Herstellung eines Projektionsobjektivs mit Folienelement

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Christian Wald; Rumen Iliew; Thomas Schicketanz; Toralf Gruner

Archive | 2013

Projection exposure method for exposure of semiconductor wafer with image of pattern of reticle for manufacturing semiconductor component, involves heating mask corresponding to two-dimensional heating profile by heating device

Ricarda Schneider; Norbert Wabra; Martin von Hodenberg; Sonja Schneider; Boris Bittner

Archive | 2011

Beleuchtungs- und Verlagerungsvorrichtung für eine Projektionsbelichtungsanlage

Sonja Schneider; Norbert Wabra; Martin von Hodenberg; Boris Bittner; Ricarda Schneider

Archive | 2015

Spiegelanordnung, Projektionsobjektiv und EUV-Lithographieanlage

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Holger Schmidt

Archive | 2014

Method for manufacturing blank for manufacturing mirror, involves determining location-dependent varying distribution of zero crossing temperature in volume of blank, based on three-dimensional profile of temperature distribution

Boris Bittner; Christian Wald; Hendrik Wagner; Norbert Wabra; Steffen Fritzsche; Sonja Schneider; Ricarda Schneider; Holger Schmidt; Walter Pauls; Florian Ahles

Archive | 2014

Illumination and displacement device for a projection exposure apparatus

Sonja Schneider; Norbert Wabra; Martin von Hodenberg; Boris Bittner; Ricarda Schneider

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Collaboration

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Boris Bittner

Carl Zeiss AG

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Norbert Wabra

Carl Zeiss AG

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Sonja Schneider

Carl Zeiss AG

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Hendrik Wagner

Carl Zeiss AG

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Holger Schmidt

Carl Zeiss AG

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Walter Pauls

Carl Zeiss AG

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Christian Wald

Carl Zeiss AG

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Rumen Iliew

Carl Zeiss AG

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Martin von Hodenberg

Carl Zeiss AG

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Florian Ahles

Carl Zeiss AG

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