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Boris Bittner

Carl Zeiss AG

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Publication

Featured researches published by Boris Bittner.

Archive | 2008

Projection objective of a microlithographic projection exposure apparatus

Olaf Conradi; Sascha Bleidistel; Markus Hauf; Wolfgang Hummel; Arif Kazi; Baerbel Schwaer; Jochen Weber; Hubert Holderer; Payam Tayebati; Boris Bittner

Archive | 2012

Projection exposure apparatus with optimized adjustment possibility

Boris Bittner; Holger Walter; Matthias Roesch

Archive | 2016

Projektionsbelichtungsanlage mit mindestens einem Manipulator

Boris Bittner; Stefan Rist

Archive | 2008

Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit

Boris Bittner; Holger Walter

Archive | 2013

Imaging Optical System for Microlithography

Olaf Rogalsky; Sonja Schneider; Boris Bittner; Jens Kugler; Bernhard Gellrich; Rolf Freimann

Archive | 2012

Method for correcting a lithography projection objective, and such a projection objective

Wilhelm Ulrich; Thomas Okon; Norbert Wabra; Toralf Gruner; Boris Bittner; Volker Graeschus

Archive | 2013

Reflektives optisches Element für den EUV-Wellenlängenbereich, Verfahren zur Erzeugung und zur Korrektur eines solchen Elements, Projektionsobjektiv für die Mikrolithographie mit einem solchen Element und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv

Markus Weiss; Norbert Kerwien; Martin Weiser; Boris Bittner; Norbert Wabra; Christoph Schlichenmaier; Wilfried Clauss

Archive | 2014

Projection Lens for EUV Microlithography, Film Element and Method for Producing a Projection Lens Comprising a Film Element

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Christian Wald; Rumen Iliew; Thomas Schicketanz; Toralf Gruner; Walter Pauls; Holger Schmidt

Archive | 2007

Method for revising/repairing a lithographic projection objective

Olaf Rogalsky; Boris Bittner; Thomas Petasch; Jochen Haeussler

Archive | 2014

Cooling system for e.g. collector mirrors, of EUV projection exposure system for lithographic manufacturing of semiconductor component, has cooling passage receiving heat from system components and discharging received heat

Stacy Figueredo; Erik Roelof Loopstra; Sonja Schneider; Markus Hauf; Boris Bittner; Norbert Wabra; Ricarda Schneider; Holger Schmidt

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Norbert Wabra

Carl Zeiss AG

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Sonja Schneider

Carl Zeiss AG

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Ricarda Schneider

Carl Zeiss AG

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Hendrik Wagner

Carl Zeiss AG

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Holger Schmidt

Carl Zeiss AG

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Walter Pauls

Carl Zeiss AG

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Christian Wald

Carl Zeiss AG

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Rumen Iliew

Carl Zeiss AG

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Martin von Hodenberg

Carl Zeiss AG

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Holger Walter

Carl Zeiss AG

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