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Sonja Schneider

Carl Zeiss AG

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Publication

Featured researches published by Sonja Schneider.

Archive | 2013

Imaging Optical System for Microlithography

Olaf Rogalsky; Sonja Schneider; Boris Bittner; Jens Kugler; Bernhard Gellrich; Rolf Freimann

Archive | 2010

Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate

Ulrich Loering; Gerd Reisinger; Franz-Josef Stickel; Sonja Schneider; Johann Trenkler; Stefan Kraus; Gordon Doering; Aksel Goehnermeier

Archive | 2014

Projection Lens for EUV Microlithography, Film Element and Method for Producing a Projection Lens Comprising a Film Element

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Christian Wald; Rumen Iliew; Thomas Schicketanz; Toralf Gruner; Walter Pauls; Holger Schmidt

Archive | 2014

Cooling system for e.g. collector mirrors, of EUV projection exposure system for lithographic manufacturing of semiconductor component, has cooling passage receiving heat from system components and discharging received heat

Stacy Figueredo; Erik Roelof Loopstra; Sonja Schneider; Markus Hauf; Boris Bittner; Norbert Wabra; Ricarda Schneider; Holger Schmidt

Archive | 2014

Spiegelanordnung für eine EUV-Projektionsbelichtungsanlage, Verfahren zum Betreiben derselben, sowie EUV-Projektionsbelichtungsanlage

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Rumen Iliew; Walter Pauls

Archive | 2013

Mirror arrangement for an euv projection exposure apparatus, method for operating the same, and euv projection exposure apparatus

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Rumen Iliew; Walter Pauls

Archive | 2013

Projektionsobjektiv für EUV-Mikrolithographie, Folienelement und Verfahren zur Herstellung eines Projektionsobjektivs mit Folienelement

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Christian Wald; Rumen Iliew; Thomas Schicketanz; Toralf Gruner

Archive | 2013

Projection exposure method for exposure of semiconductor wafer with image of pattern of reticle for manufacturing semiconductor component, involves heating mask corresponding to two-dimensional heating profile by heating device

Ricarda Schneider; Norbert Wabra; Martin von Hodenberg; Sonja Schneider; Boris Bittner

Archive | 2011

Beleuchtungs- und Verlagerungsvorrichtung für eine Projektionsbelichtungsanlage

Sonja Schneider; Norbert Wabra; Martin von Hodenberg; Boris Bittner; Ricarda Schneider

Archive | 2015

Spiegelanordnung, Projektionsobjektiv und EUV-Lithographieanlage

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Holger Schmidt

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Collaboration

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Boris Bittner

Carl Zeiss AG

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Norbert Wabra

Carl Zeiss AG

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Ricarda Schneider

Carl Zeiss AG

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Hendrik Wagner

Carl Zeiss AG

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Holger Schmidt

Carl Zeiss AG

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Walter Pauls

Carl Zeiss AG

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Christian Wald

Carl Zeiss AG

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Rumen Iliew

Carl Zeiss AG

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Martin von Hodenberg

Carl Zeiss AG

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Florian Ahles

Carl Zeiss AG

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