Christophe Marcadal
Applied Materials
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Publication
Featured researches published by Christophe Marcadal.
advanced semiconductor manufacturing conference | 1999
K.C. Lin; Christophe Marcadal; S. Ganguli; Bo Zheng; J. Schmitt; Ling Chen
The mass spectrometric technique for monitoring copper chemical vapor deposition process using Cu(hfac)(tmvs) has been investigated. Characterization of the process chemistry identified the main ionic species that could be used to monitor and study the process. Reactant flow rate and the mass spectrometric signal of TMVS was found to have linear relationship. The process monitor response time for the reactants and the product species was of the order of seconds. The reproducibility of the Cu CVD process was studied by using a process-monitoring recipe. This process monitoring technique has been used for tool and process optimization.
Archive | 2006
Paul F. Ma; Kavita Shah; Dien-Yeh Wu; Seshadri Ganguli; Christophe Marcadal; Frederick C. Wu; Schubert S. Chu
Archive | 2001
Ling Chen; Seshadri Ganguli; Christophe Marcadal; Wei Cao; Roderick Craig Mosely; Mei Chang
Archive | 2002
Ming Xi; Paul Frederick Smith; Ling Chen; Michael X. Yang; Mei Chang; Fusen Chen; Christophe Marcadal; Jenny Lin
Archive | 2005
Ling Chen; Vincent Ku; Hua Chung; Christophe Marcadal; Seshadri Ganguli; Jenny Lin; Dien-Yeh Wu; Alan Ouye; Mei Chang
Archive | 1999
Ling Chen; Seshadri Ganguli; Bo Zheng; Samuel Wilson; Christophe Marcadal
Archive | 2000
Ling Chen; Seshadri Ganguli; Wei Cao; Christophe Marcadal
Archive | 2002
Ling Chen; Seshadri Ganguli; Wei Cao; Christophe Marcadal
Archive | 2005
Christophe Marcadal; Rongjun Wang; Hua Chung; Nirmalya Maity
Archive | 2003
Ling Chen; Seshadri Ganguli; Wei Cao; Christophe Marcadal
