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Douglas D. Coolbaugh

GlobalFoundries

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Publication

Featured researches published by Douglas D. Coolbaugh.

Archive | 2004

Metal-insulator-metal capacitor and method of fabrication

Douglas D. Coolbaugh; Ebenezer E. Eshun; Jeffrey P. Gambino; Zhong-Xiang He

Archive | 2007

INTEGRATED CIRCUIT (IC) CHIP WITH ONE OR MORE VERTICAL PLATE CAPACITORS AND METHOD OF MAKING THE CAPACITORS

Anil K. Chinthakindi; Douglas D. Coolbaugh; Ebenezer E. Eshun; Zhong-Xiang He; Anthony K. Stamper; Kunal Vaed

Archive | 2006

LATERAL SILICIDED DIODES

Douglas D. Coolbaugh; Jeffrey B. Johnson; Xuefeng Liu; Bradley A. Orner; Robert M. Rassel; David C. Sheridan

Archive | 2006

DIRECT TERMINATION OF A WIRING METAL IN A SEMICONDUCTOR DEVICE

Anil K. Chinthakindi; Douglas D. Coolbaugh; Timothy J. Dalton; Ebenezer E. Eshun; Anthony K. Stamper; Richard P. Volant

Archive | 2010

Verflochtener vertikaler Parallelkondensator Intertwined vertical parallel capacitor

Roger A. Booth; Douglas D. Coolbaugh; Ebenezer E. Eshun; Zhong-Xiang He

Archive | 2009

Integrationsstruktur und -verfahren für metall-gate mit metallsicherung, antischmelzsicherung und/oder widerstand

Ebenezer E. Eshun; Zhong-Xiang He; Robert M. Rassel; Douglas D. Coolbaugh; Ephrem G. Gebreselasie; Ping-Chuan Wang; Deok-kee Kim; Chandrasekharan Kothandaraman; Norman Robson; Dan Moy; John M. Safran; Kenneth J. Stein; Herbert L. Ho; Hongwen Yan

Archive | 2007

Procede de double damasquinage pour la fabrication de structure de fil epais

Douglas D. Coolbaugh; Keith E. Downes; Peter J. Lindgren; Anthony K. Stamper

Archive | 2007

Doppel-damaszen-prozess zur herstellung einer dickdrahtstruktur

Douglas D. Coolbaugh; Keith E. Downes; Peter J. Lindgren; Anthony K. Stamper

Archive | 2005

Formation de condensateur metal isolant metal simultanement avec un niveau de cablage metallique en aluminium au moyen d'un masque dur

Douglas D. Coolbaugh; Ebenezer E. Eshun; Natalie B. Feilchenfeld; Michael L. Gautsch; Zhong-Xiang He; Matthew D. Moon; Barbara Waterhouse

Archive | 2005

Feol/meol-metallwiderstand für high-end-cmos

Anil K. Chinthakindi; Douglas D. Coolbaugh; Robert M. Rassel

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Collaboration

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Ebenezer E. Eshun

IBM

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Zhong-Xiang He

IBM

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Robert M. Rassel

IBM

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Anil K. Chinthakindi

IBM

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Anthony K. Stamper

IBM

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Natalie B. Feilchenfeld

IBM

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Barbara Waterhouse

IBM

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Jeffrey P. Gambino

IBM

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Matthew D. Moon

IBM

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Michael L. Gautsch

IBM

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