Franz X. Zach

Aberration analysis using reconstructed aerial images of isolated contacts on attenuated phase-shift masks

A technique for the evaluation of scanner lens aberration is described and analyzed. The method is based on the reconstruction of aerial image distribution using a double exposure technique: A first exposure of the mask feature of interest is followed by uniform background exposure. The topdown images in resist at increasing background exposure dose are analyzed using suitable threshold algorithms to obtain a set of aerial image intensity contour lines. This technique has been applied to the analysis of aerial images formed by isolated contacts using an attenuated PSM. Of particular interest in this case is the aerial image intensity present on the first sidelobe and its angular dependence. In the absence of lens aberrations the sidelobe intensity has no angular dependence whereas the presence of aberrations in the lens generally results in a non-uniform angular sidelobe intensity distributions. A detailed theoretical analysis of the capabilities of this method is being presented: Linearity, zero response and expected results in the presence of various Zernike terms have been studied. We were not only able to separate Zernike terms based on their angular dependence but we also propose a method to assess the order of the radial component.

Neural-network-based approach to resist modeling and OPC

Resist modeling based on aerial image parameters is an attractive approach to account for resist effects in optical proximity correction. The goal of this work is to introduce neural networks as a means to tackle this problem. We first discuss some of the issues associated with resist modeling based on a fixed, predetermined set of aerial image parameters such as the maximum aerial image intensity. This methodology is found to encounter difficulties if used in conjunction with resolution enhancement techniques such as sub resolution assist features. More specifically we find that layouts characterized by identical values in the aerial image parameters used for modeling experimentally do not always require the same resist correction. As a result modeling errors are introduced that can only be resolved by searching for additional parameters. We have made an attempt to develop an alternate methodology with higher flexibility within the generic framework of a mapping technique. The model uses aerial images taken at a predefined set of sampling points as input parameters. A neural network is used to model the resist effects, taking advantage of the nonlinear non local capabilities of such a system. Using the well defined training methodologies available for neural networks resist models can be calibrated in a fashion similar to standard fitting routines. We first optimize the structure of the neural network based on simulations data derived from a lumped parameter model. A two- layer, non-linear network is found to provide good modeling capabilities for a wide range of resist conditions as well as real 193 nm resist data.

Subwavelength alignment mark signal analysis of advanced memory products

The impact of alignment mark structure, mark geometry, and stepper alignment optical system on mark signal contrast was investigated using computer simulation. Several sub-wavelength poly silicon recessed film stack alignment targets of advanced memory products were studied. Stimulated alignment mark signals for both dark-field and bright-field systems using the rigorous electromagnetic simulation program TEMPEST showed excellent agreement with experimental data. For a dark-field alignment system, the critical parameters affecting signal contrast were found to be mark size and mark recess depth below silicon surface. On the other hand, film stack thickness and mark recess depth below/above silicon surface are the important parameters for a bright-field alignment system. From observed simulation results optimal process parameters are determined. Based on the simulation results some signal enhancement techniques will be discussed.

Process dependencies of optical proximity corrections

Optical Proximity Correction has emerged as an industry standard technique to reproduce the desired shapes on wafers as pattern dimensions are approaching the optical resolution limits. However secondary effects, if not properly controlled, may impede successful application of this technique. In order to better assess these factors we have divided the overall pattern formation process into several obvious components: The illumination system, mask, projection optics, resist system and finally etch processes. Each one of these components influences the optical proximity effects observed in the final pattern. The dependence of optical proximity corrections on the type of illumination is fairly well known and will only be touched on. Variations in the mask manufacturing process such as deviations of the mask critical dimension from its nominal value will be discussed. The type of e-beam exposure tool used to write the mask was found to have profound impact on optical proximity correction and therefore specifying the type of mask writing tool and sometimes even its writing mode to ensure reproducible results is required. Lens aberrations in the optical exposure tool and their impact were studied using aerial image simulations. Examples of optical proximity curves from different first generation tools show significant differences even between tools of the same type. Resist effects and the variations induced by modifying etch processes were investigated emphasizing that a fairly detailed control of the overall pattern formation process is necessary to successfully implement any OPC approach.

Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography

Multiple contact hole resist samples from a variety of DUV resist suppliers, including both acetal and ESCAP chemistries are evaluated on an organic anti-reflective under layer (ARC) using an attenuated phase shift mask (APSM). One sample exhibited excellent surface inhibition and superior lithographic performance for patterning contact holes of 0.2 micrometers imaging size. For most of resists, the process windows are limited by unwanted sidelobe printing through focus. The sensitivity of sidelobe printing to focus can be attributed to lens aberrations. For the first time, we prose to use Depth-of-focus (DOF) loss PWLdof and Exposure latitude (EL) loss PWLel to characterize resists surface inhibition, as well discovered that DOF loss is a sensitive measure of surface inhibition. Similar lithographic performance is obtained from acetal and ESCAP based materials. The two ESCAP resists EB3 and EA2 have better oxide etch resistance than the acetal resist AC1. The top surface reticulation is observed on ESCAP resist EB3 and EA2 during the oxide etch, but not on the acetal resist AC1. 110 nm underexposed resolutions achieved with the resist EA4 at a mask size of 250 nm. Faster resists generally exhibit better resolution but have smaller process windows when side lobe printing is included as a criterion. Selection of a resist formulation for attenuated phase shift applications has to face a compromise between resolution, photospeed, process window and surface inhibition. Finally, ARC operational modes and optical properties had little effect on sidelobe printing, and optimization of PEB temperature is important in suppressing sidelobe printing.

Optimization of segmented alignment marks for advanced semiconductor fabrication processes

The continued downscaling of semiconductor fabrication ground rule has imposed increasingly tighter overlay tolerances, which becomes very challenging at the 100 nm lithographic node. Such tight tolerances will require very high performance in alignment. Past experiences indicate that good alignment depends largely on alignment signal quality, which, however, can be strongly affected by chip design and various fabrication processes. Under some extreme circumstances, they can even be reduced to the non- usable limit. Therefore, a systematic understanding of alignment marks and a method to predict alignment performance based on mark design are necessary. Motivated by this, we have performed a detailed study of bright field segmented alignment marks that are used in current state-of- the-art fabrication processes. We find that alignment marks at different lithographic levels can be organized into four basic categories: trench mark, metal mark, damascene mark, and combo mark. The basic principles of these four types of marks turn out to be so similar that they can be characterized within the theoretical framework of a simple model based on optical gratings. An analytic expression has been developed for such model and it has been tested using computer simulation with the rigorous time-domain finite- difference (TD-FD) algorithm TEMPEST. Consistent results have been obtained; indicating that mark signal can be significantly improved through the optimization of mark lateral dimensions, such as segment pitch and segment width. We have also compared simulation studies against experimental data for alignment marks at one typical lithographic level and a good agreement is found.

Is model-based optical proximity correction ready for manufacturing? Study on 0.12- and 0.175-μm DRAM technology

Two full-chip OPC approaches, a traditional rule-based approach and a more recent model-based approach are compared on DRAM applications using both ArF and KrF lithography, with off-axis illumination and phase shift masks. The similarities and differences between these two OPC approaches are compared in detail with selected one- and two-dimensional layout situations. Our results from the model-based approach show good line width control for one- dimensional structures and improved line-end printing for two-dimensional structures; however, results also show severe process window limitations for some layouts. The cause of the process window limitations with the model-based approach are discussed. To address the process window limitations in the model-based approach, a rule-based pre- correction was used to ensure adequate process window at deviated dose and focus conditions. With pre-correction combined with the model-based approach, our wafer data shows good correction quality and process window.

Approach to pattern aspect ratio control

Many semiconductor chip designs require precise simultaneous control of both the width and length of asymmetric features. Line shortening due to optical, resist processing, and mask effects cause the process windows for width and length to diverge. Typically differential mask biasing has ben used to maximize the common process window for both axes. As we enter the gigabit era limitations in grid size and mask write times may become significant restrictions to meeting required device tolerances with that approach. Simulations of aerial image and resist processing using SPLAT and LEOPOLD indicate that for a given mask there is considerable latitude to adjust the length of features without a significant loss of process window. An experimental design matrix was used to verify the simulation results and develop a regression mode of pupil fill, numerical aperture, and resist diffusion effects. This model was then applied to optimize the processing conditions for several product masks. This technique is particularly useful early in the development cycle when mask to mask repeatability is poor and lead times are long. It may also be use to fine tune image sizes in manufacturing.