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Guenther Dengel

Carl Zeiss AG

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Publication

Featured researches published by Guenther Dengel.

Archive | 2008

Method for producing facet mirrors and projection exposure apparatus

Berndt Warm; Sigfried Rennon; Udo Dinger; Juergen Baier; Stefan Burkart; Christos Kourouklis; Hin Yiu Anthony Chung; Stefan Wiesner; Hartmut Enkisch; Guenther Dengel

Archive | 2009

Illuminating optic for euv microlithography

Guenther Dengel; Gero Wittich; Udo Dinger; Ralf Stuetzle; Martin Endres; Jens Ossmann; Berndt Warm

Archive | 2007

ILLUMINATION OPTICS FOR PROJECTION MICROLITHOGRAPHY

Berndt Warm; Guenther Dengel

Archive | 2011

ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY

Guenther Dengel; Gero Wittich; Udo Dinger; Ralf Stuetzle; Martin Endres; Jens Ossmann; Berndt Warm

Archive | 2007

Mirror with a mirror carrier and projection exposure apparatus

Rutger Wevers; Andreas Seifert; Joachim Hartjes; Guenther Dengel

Archive | 2007

MICROLITHOGRAPHY ILLUMINATION SYSTEMS, COMPONENTS AND METHODS

Berndt Warm; Guenther Dengel

Archive | 2010

Optical arrangement in a projection exposure apparatus for euv lithography

Dirk Heinrich Ehm; Stefan-Wolfgang Schmidt; Guenther Dengel

Archive | 2008

Apparatus for the manipulation and/or adjustment of an optical element

Frank Melzer; Markus Weiss; Guenther Dengel; Volker Stein

Archive | 2012

OPTICAL ARRANGEMENT, IN PARTICULAR IN A PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY

Dirk Heinrich Ehm; Stefan-Wolfgang Schmidt; Guenther Dengel

Archive | 2013

Method and cooling system for cooling an optical element for euv applications

Guenther Dengel; Joachim Hartjes

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Collaboration

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Berndt Warm

Carl Zeiss AG

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Udo Dinger

Carl Zeiss AG

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Gero Wittich

Carl Zeiss AG

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Jens Ossmann

Carl Zeiss AG

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Joachim Hartjes

Carl Zeiss AG

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Martin Endres

Carl Zeiss AG

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Ralf Stuetzle

Carl Zeiss AG

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Dirk Heinrich Ehm

Carl Zeiss AG

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Stefan-Wolfgang Schmidt

Carl Zeiss AG

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Andreas Seifert

Carl Zeiss AG

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