Harald Seidl
Infineon Technologies
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Publication
Featured researches published by Harald Seidl.
Thin Solid Films | 2003
Stefan Jakschik; Uwe Schroeder; Thomas Hecht; Martin Gutsche; Harald Seidl; Johann W. Bartha
Abstract Integration of materials with a high dielectric constant into storage or gate capacitor applications requires a detailed understanding of the crystallization behavior. The dependence of crystallinity on annealing temperature and time was studied for thin atomic-layer-deposited (ALD) Al 2 O 3 films of varying thickness, using grazing-incidence X-ray diffraction. The correlation between dielectric constant and annealing condition was investigated and an increase in dielectric constant due to annealing was observed.
Archive | 2001
Harald Seidl; Martin Gutsche
Archive | 2003
Annette Saenger; Bernhard Sell; Harald Seidl; Thomas Hecht; Martin Gutsche
Archive | 2003
Bernd Goebel; Jörn Lützen; Martin Popp; Harald Seidl
Archive | 2005
Martin Gutsche; Harald Seidl
Archive | 2005
Martin Gutsche; Harald Seidl; Franz Kreupl
Archive | 2002
Martin Gutsche; Thomas Hecht; Matthias Leonhardt; Uwe Schröder; Harald Seidl
Archive | 2003
Harald Seidl; Martin Gutsche
Archive | 2006
Martin Gutsche; Harald Seidl
Archive | 2003
Harald Seidl; Annette Sänger; Stephan Kudelka; Martin Gutsche
