Stefan Jakschik

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Meeting Abstracts | 2006

Roger Loo; Peter Verheyen; Rita Rooyackers; Christian Walczyk; Frederik Leys; Denis Shamiryan; P. Absil; Tinne Delande; Alain Moussa; Hans Weijtmans; R. Wise; Vladimir Machkaoutsan; Chantal J. Arena; John McCormack; Sophie Passefort; Haruyuki Sorada; Akira Inoue; Byeong Chan Lee; Sangjin Hyun; Stefan Jakschik; Matty Caymax; Geert Eneman; Hugo Bender; Chris Drijbooms; Luc Geenen; Pierre Tomasini; Stéphane Godny

SiGe R. Loo, P. Verheyen, R. Rooyackers, C. Walczyk*, F.E. Leys, D. Shamiryan, P.P. Absil, T. Delande, A. Moussa, J.W. Weijtmans, R. Wise, V. Machkaoutsan, C. Arena, J. McCormack, S. Passefort, H. Sorada, A. Inoue, B.C. Lee, S. Hyun, S. Jakschik, and M. Caymax 1 IMEC, Kapeldreef 75, 3001 Leuven (Belgium), *also Universitat Siegen, Holderlinstrasse 35, 7068 Siegen (Germany), Texas Instruments Inc., 13560 North Central Expressway, Dallas (USA), ASM-Belgium, Kapeldreef 75, 3001 Leuven (Belgium), ASM-America, 3440 East University Drive, Phoenix, (USA), KLA-Tencor Corp. 160 Rio Robles, San Jose (USA), Matsushita assignee at IMEC, Samsung assignee at IMEC, Infineon assignee at IMEC

Archive | 2008

Stefan Jakschik; Nadine Collaert

Archive | 2010

Stefan Jakschik; Nadine Collaert

Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-based CMOS 4: New Materials, Processes, and Equipment. ECS Transactions | 2008

Sofie Mertens; Thomas Hoffmann; C. Vrancken; Stefan Jakschik; Olivier Richard; Eveline Verleysen; Hugo Bender; Chao Zhao; Wilfried Vandervorst; P. Absil; Anne Lauwers

Archive | 2007