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Featured researches published by Kazuhiro Tomioka.


international symposium on semiconductor manufacturing | 1998

Quick-turnaround-time improvement for product development and transfer to mass production

Hidetoshi Koike; Fumitomo Matsuoka; Shinichi Hohkibara; Etsuo Fukuda; Kazuhiro Tomioka; Hideshi Miyajima; Kouichi Muraoka; Nobuo Hayasaka; Minoru Kimura

We describe equipment and facility operational methods in a production fab which are designed to achieve quick-turnaround-time (QTAT) manufacturing and ease product transfer from development to mass production. An advanced CIM system with precise lot management is introduced to keep the optimum balance of manufacturing TAT and throughput. Substantial end-user computing reduces the engineering holding time for handling development lots. In situ monitoring technologies are applied for the utilization enhancement of plasma-assisted equipment. A 9% manufacturing TAT reduction and a 14% throughput increase are estimated using a manufacturing simulator. The number of wafers in QTAT lots is reduced for processing time reduction. As a result, manufacturing TAT of QTAT lots with reduction from 24 wafers to three is reduced to 56% compared with that of normal lots in the production fab. This new production fab realizes QTAT development and agile product transfer from development to mass production with full process compatibility.


symposium on vlsi technology | 2004

A 0.602 /spl mu/m/sup 2/ nestled 'Chain' cell structure formed by one mask etching process for 64 Mbit FeRAM

Hiroyuki Kanaya; Kazuhiro Tomioka; T. Matsushita; Mototsugu Omura; T. Ozaki; Y. Kumura; Yoshiro Shimojo; Takuya Morimoto; O. Hidaka; Susumu Shuto; H. Koyama; Yuki Yamada; K. Osari; N. Tokoh; F. Fujisaki; N. Iwabuchi; Naoto Yamaguchi; Tetsu Watanabe; M. Yabuki; H. Shinomiya; Naohiro Watanabe; E. Itoh; T. Tsuchiya; K. Yamakawa; K. Natori; S. Yamazaki; Kou Nakazawa; D. Takashima; S. Shiratake; S. Ohtsuki


Archive | 2009

Semiconductor device having multiple wiring layers and method of producing the same

Yoshiaki Shimooka; Hideki Shibata; Hideshi Miyajima; Kazuhiro Tomioka


Solid-state Electronics | 2006

A SrRuO3/IrO2 top electrode FeRAM with Cu BEOL process for embedded memory of 130 nm generation and beyond

Yoshinori Kumura; T. Ozaki; Hiroyuki Kanaya; O. Hidaka; Yoshiro Shimojo; Susumu Shuto; Yuki Yamada; Kazuhiro Tomioka; Koji Yamakawa; Soichi Yamazaki; Daisaburo Takashima; Tadashi Miyakawa; Shinichiro Shiratake; Sumito Ohtsuki; Iwao Kunishima; Akihiro Nitayama


Archive | 2003

Hardmask with high selectivity for Ir barriers for ferroelectic capacitor manufacturing

Ulrich Egger; Haoren Zhuang; Yoshinori Kumura; Kazuhiro Tomioka; Hiroyuki Kanaya


symposium on vlsi technology | 2006

High-density and high-speed 128Mb chain FeRAM™ with SDRAM-compatible DDR2 interface

Yoshiro Shimojo; Atsushi Konno; Jun Nishimura; Takayuki Okada; Yuki Yamada; Soichiro Kitazaki; Hironobu Furuhashi; Soichi Yamazaki; Katsunori Yahashi; Kazuhiro Tomioka; Yoshihiro Minami; Hiroyuki Kanaya; Susumu Shuto; Koji Yamakawa; Tohru Ozaki; Hidehiro Shiga; Tadashi Miyakawa; Shinichiro Shiratake; Daisaburo Takashima; Iwao Kunishima; Takeshi Hamamoto; Akihiro Nitayama


Archive | 2005

Semiconductor memory device having ferroelectric capacitors with hydrogen barriers

Yoshinori Kumura; Iwao Kunishima; Hiroyuki Kanaya; Tohru Ozaki; Kazuhiro Tomioka


european solid state device research conference | 2005

A SrRuO/sub 3//IrO/sub 2/ top electrode FeRAM with Cu BEOL process for embedded memory of 130nm generation and beyond

Yoshinori Kumura; T. Ozaki; Hiroyuki Kanaya; O. Hidaka; Yoshiro Shimojo; Susumu Shuto; Yuki Yamada; Kazuhiro Tomioka; Koji Yamakawa; Soichi Yamazaki; Daisaburo Takashima; Tadashi Miyakawa; Shinichiro Shiratake; Sumito Ohtsuki; Iwao Kunishima; Akihiro Nitayama


Archive | 2004

Sidewall structure and method of fabrication for reducing oxygen diffusion to contact plugs during CW hole reactive ion etch processing

Haoren Zhuang; Ulrich Egger; Kazuhiro Tomioka; Jingyu Lian; Nicolas Nagel; Andreas Hilliger; Gerhard Beitel


Archive | 2014

MAGNETIC MEMORY HAVING MAGNETORESISTIVE ELEMENT AND METHOD OF MANUFACTURING MAGNETORESISTIVE ELEMENT

Masatoshi Yoshikawa; Yasuyuki Sonoda; Satoshi Seto; Shuichi Tsubata; Kazuhiro Tomioka

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