Makoto Suwa

A 45-ns 64-Mb DRAM with a merged match-line test architecture

A single 3.3-V 64-Mb dynamic RAM (DRAM) with a chip size of 233.8 mm/sup 2/ has been fabricated using 0.4- mu m CMOS technology with double-level metallization. The dual-cell-plate (DCP) cell structure is applied with a cell size of 1.7 mu m/sup 2/, and 30-fF cell capacitance has been achieved using an oxynitride layer (t/sub eff/=5 nm) as the gate insulator. The RAM implements a new data-line architecture called the merged match-line test (MMT) to achieve faster access time and shorter test time with the least chip-area penalty. The MMT architecture makes it possible to get a RAS access time of 45 ns and reduces test time by 1/16000. A parallel MMT technique, which is an extended mode of MMT, leads to the further test-time reduction of 1/64000. Therefore, all 64 Mb are tested in only 1024 cycles, and the test time is only 150 mu s with 150-ns cycle time. >