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Martin von Hodenberg

Carl Zeiss AG

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Publication

Featured researches published by Martin von Hodenberg.

Archive | 2013

Projection exposure method for exposure of semiconductor wafer with image of pattern of reticle for manufacturing semiconductor component, involves heating mask corresponding to two-dimensional heating profile by heating device

Ricarda Schneider; Norbert Wabra; Martin von Hodenberg; Sonja Schneider; Boris Bittner

Archive | 2013

Projection Exposure Apparatus with at least One Manipulator

Boris Bittner; Norbert Wabra; Martin von Hodenberg

Archive | 2011

Beleuchtungs- und Verlagerungsvorrichtung für eine Projektionsbelichtungsanlage

Sonja Schneider; Norbert Wabra; Martin von Hodenberg; Boris Bittner; Ricarda Schneider

Archive | 2014

Illumination and displacement device for a projection exposure apparatus

Sonja Schneider; Norbert Wabra; Martin von Hodenberg; Boris Bittner; Ricarda Schneider

Archive | 2014

Reflective optical element for arrangement near e.g. box in extreme UV lithography device that, has multi-position system for providing wavelength at range, where waves exhibit surface layer with thickness that lies between two thicknesses

Norbert Wabra; Boris Bittner; Martin von Hodenberg

Archive | 2014

Mikrolithographische Projektionsbelichtungsanlage und Verfahren zur Veränderung einer optischen Wellenfront in einem katoptrischen Objektiv einer solchen Anlage

Boris Bittner; Norbert Wabra; Martin von Hodenberg; Ricarda Schneider; Sonja Schneider

Archive | 2014

Systemkorrektur aus langen Zeitskalen

Norbert Wabra; Martin von Hodenberg; Sonja Schneider; Ricarda Schneider; Rüdiger Mack; Boris Bittner

Archive | 2016

PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY

Boris Bittner; Norbert Wabra; Martin von Hodenberg; Sonja Schneider

Archive | 2015

Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithographie

Boris Bittner; Norbert Wabra; Martin von Hodenberg; Sonja Schneider

Archive | 2014

Reflektives optisches Element für die EUV-Lithographie

Norbert Wabra; Boris Bittner; Martin von Hodenberg; Hartmut Enkisch; Stephan Müllender; Olaf Conradi

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Collaboration

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Boris Bittner

Carl Zeiss AG

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Norbert Wabra

Carl Zeiss AG

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Sonja Schneider

Carl Zeiss AG

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Ricarda Schneider

Carl Zeiss AG

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Hartmut Enkisch

Carl Zeiss AG

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Olaf Conradi

Carl Zeiss AG

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Rüdiger Mack

Carl Zeiss AG

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Stephan Müllender

Carl Zeiss AG

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Stephan Muellender

Carl Zeiss AG

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