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Dive into the research topics where Masamitsu Ito is active.

Publication


Featured researches published by Masamitsu Ito.


Archive | 1993

Exposure mask and manufacturing method and device therefor

Masamitsu Ito; Shinichi Ito; Kenji Kawano; Iwao Tokawa; 信一 伊藤; 正光 伊藤; 健二 川野; 巌 東川


Archive | 2002

Mask substrate and method of manufacturing the same

Masamitsu Ito; 正光 伊藤


Archive | 1998

Method and device for electron beam drawing

Takayuki Abe; Yoshiaki Hattori; Tomohiro Iijima; Masamitsu Ito; Takashi Kamikubo; Mitsuko Shimizu; Naoharu Shimomura; 貴司 上久保; 尚治 下村; 正光 伊藤; 芳明 服部; みつ子 清水; 隆幸 阿部; 智浩 飯島


Archive | 2001

METHOD AND DEVICE FOR DEFECT INSPECTION OF PHOTOMASK AND RECORDING MEDIUM

Masamitsu Ito; Shinji Yamaguchi; 正光 伊藤; 真司 山口


Archive | 2005

Substrate for photomask blank, photomask blank, and photomask

Tsuneyuki Hagiwara; Masamitsu Ito; Naohito Kondo; Tadayuki Mogi; Masayuki Nakatsu; Tsuneo Numanami; 正幸 中津; 正光 伊藤; 恒夫 沼波; 均之 茂木; 恒幸 萩原; 尚人 近藤


Archive | 2003

Method of manufacturing exposure mask substrate, method of manufacturing exposure mask, and method of manufacturing semiconductor device

Masamitsu Ito; 正光 伊藤


Archive | 2004

Method for manufacturing exposure mask, exposure apparatus, method for manufacturing semiconductor device, and mask blank product

Masamitsu Ito; 正光 伊藤


Archive | 2006

Method for manufacturing photomask and method for manufacturing semiconductor device

Kazuya Fukuhara; Takashi Hirano; Masamitsu Ito; 正光 伊藤; 隆 平野; 和也 福原


Archive | 2005

Evaluation method for mask pattern and evaluation device

Masamitsu Ito; 正光 伊藤


Archive | 2007

Euv mask manufacturing method and semiconductor device manufacturing method using euv mask

Masamitsu Ito; 正光 伊藤

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