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Norman Baer

Carl Zeiss AG

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Publication

Featured researches published by Norman Baer.

Archive | 2013

EUV Exposure Apparatus

Norman Baer; Ulrich Loering; Oliver Natt; Gero Wittich; Timo Laufer; Peter Kuerz; Guido Limbach; Stefan Hembacher; Holger Walter; Yim-Bun-Patrick Kwan; Markus Hauf; Franz-Josef Stickel; Jan Van Schoot

Archive | 2013

Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus

Markus Hauf; Norman Baer; Holger Walter; Joachim Hartjes

Archive | 2011

Mirror, projection objective comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective

Rolf Freimann; Norman Baer; Guido Limbach; Thure Boehm; Gero Wittich

Archive | 2016

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

Norman Baer; Ulrich Loering; Oliver Natt; Gero Wittich; Timo Laufer; Peter Kuerz; Guido Limbach; Stefan Hembacher; Holger Walter; Yim-Bun-Patrick Kwan; Markus Hauf; Franz-Josef Stickel; Jan Van Schoot

Archive | 2013

Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objective

Rolf Freimann; Norman Baer; Guido Limbach; Thure Boehm; Gero Wittich

Archive | 2013

Optical arrangement for euv lithography

Norman Baer; Toralf Gruner; Ulrich Löring

Archive | 2012

Extreme UV (EUV) mirror for projection exposure system, has heat conducting layer having preset values of absolute and specific heat conductivity and average thickness, that is arranged between substrate and layer stack

Norman Baer; Guido Limbach; Thure Böhm; Gero Wittich

Archive | 2014

Extreme UV (EUV) projection exposure system used for microlithography process, has control unit that controls heating/cooling device, so that absolute constant temperature profile is adjustable in partial region of mirrors

Norman Baer; Erwin Gaber; Jochen Hetzler; András G. Major

Archive | 2014

OPTICAL ARRANGEMENT, EUV LITHOGRAPHY APPARATUS AND METHOD FOR CONFIGURING AN OPTICAL ARRANGEMENT

Norman Baer; Toralf Gruner; Ulrich Loering

Archive | 2013

Agencement optique pour lithographie en ultraviolet extrême (euv)

Norman Baer; Toralf Gruner; Ulrich Löring

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Collaboration

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Gero Wittich

Carl Zeiss AG

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Guido Limbach

Carl Zeiss AG

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Holger Walter

Carl Zeiss AG

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Markus Hauf

Carl Zeiss AG

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Rolf Freimann

Carl Zeiss AG

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Thure Boehm

Carl Zeiss AG

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Toralf Gruner

Carl Zeiss AG

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Ulrich Loering

Carl Zeiss AG

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Franz-Josef Stickel

Carl Zeiss AG

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Jan Van Schoot

Carl Zeiss AG

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