Norman Baer

EUV Exposure Apparatus

Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus

Mirror, projection objective comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objective

Optical arrangement for euv lithography

Extreme UV (EUV) mirror for projection exposure system, has heat conducting layer having preset values of absolute and specific heat conductivity and average thickness, that is arranged between substrate and layer stack

Extreme UV (EUV) projection exposure system used for microlithography process, has control unit that controls heating/cooling device, so that absolute constant temperature profile is adjustable in partial region of mirrors

OPTICAL ARRANGEMENT, EUV LITHOGRAPHY APPARATUS AND METHOD FOR CONFIGURING AN OPTICAL ARRANGEMENT

Agencement optique pour lithographie en ultraviolet extrême (euv)