Is this you? Create Your Porfile
Avatar

Holger Walter

Carl Zeiss AG

Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Explore More

Hotspot

Dive into the research topics where Holger Walter is active.

Explore More

Publication

Featured researches published by Holger Walter.

Archive | 2012

Projection exposure apparatus with optimized adjustment possibility

Boris Bittner; Holger Walter; Matthias Roesch

Archive | 2013

EUV Exposure Apparatus

Norman Baer; Ulrich Loering; Oliver Natt; Gero Wittich; Timo Laufer; Peter Kuerz; Guido Limbach; Stefan Hembacher; Holger Walter; Yim-Bun-Patrick Kwan; Markus Hauf; Franz-Josef Stickel; Jan Van Schoot

Archive | 2008

Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit

Boris Bittner; Holger Walter

Archive | 2007

SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY

Gerhard Fürter; Ulrich Löring; Daniel Krähmer; Aurelian Dodoc; Heiko Feldmann; David Shafer; Wilhelm Ulrich; Holger Walter; Johannes Zellner

Archive | 2010

Optical system, exposure apparatus, and waverfront correction method

Matthias Exler; Ulrich Löring; Toralf Gruner; Holger Walter

Archive | 2013

Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus

Markus Hauf; Norman Baer; Holger Walter; Joachim Hartjes

Archive | 2012

OPTICAL SYSTEM OF MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND METHOD OF CORRECTING WAVEFRONT DEFORMATION IN SAME

Matthias Exler; Ulrich Loering; Toralf Gruner; Holger Walter

Archive | 2016

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

Norman Baer; Ulrich Loering; Oliver Natt; Gero Wittich; Timo Laufer; Peter Kuerz; Guido Limbach; Stefan Hembacher; Holger Walter; Yim-Bun-Patrick Kwan; Markus Hauf; Franz-Josef Stickel; Jan Van Schoot

Archive | 2014

Method of operating a microlithographic projection exposure apparatus and projection objective of such an apparatus

Holger Walter; Boris Bittner

Archive | 2012

PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT FUNCTION

Boris Bittner; Holger Walter; Matthias Roesch

Explore More

Collaboration

Dive into the Holger Walter's collaboration.

Top Co-Authors
Avatar

Boris Bittner

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Ulrich Löring

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Johannes Zellner

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Matthias Roesch

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Ulrich Loering

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Daniel Krähmer

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Markus Hauf

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Norman Baer

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Andreas Frommeyer

Carl Zeiss AG

View shared research outputs
Top Co-Authors
Avatar

Axel Lorenz

Carl Zeiss AG

View shared research outputs
Explore More
Researchain Logo
Decentralizing Knowledge