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Ulrich Loering

Carl Zeiss AG

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Publication

Featured researches published by Ulrich Loering.

Archive | 2008

Projection objective for immersion lithography

Karl-Stefan Weissenrieder; Alexander Hirnet; Alexandra Pazidis; Karl-Heinz Schuster; Christoph Zaczek; Michael Lill; Patrick Scheible; Harald Schink; Markus Brotsack; Ulrich Loering; Toralf Gruner; Guenter Scheible

Archive | 2005

Exposure apparatus and measuring device for a projection lens

Albrecht Ehrmann; Ulrich Wegmann; Rainer Hoch; Joerg Mallmann; Karl-Heinz Schuster; Ulrich Loering; Toralf Gruner; Bernhard Kneer; Bernhard Geuppert; Franz Sorg; Jens Kugler; Norbert Wabra

Archive | 2013

EUV Exposure Apparatus

Norman Baer; Ulrich Loering; Oliver Natt; Gero Wittich; Timo Laufer; Peter Kuerz; Guido Limbach; Stefan Hembacher; Holger Walter; Yim-Bun-Patrick Kwan; Markus Hauf; Franz-Josef Stickel; Jan Van Schoot

Archive | 2009

Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations

Guido Limbach; Franz Sorg; Armin Schoeppach; Ulrich Weber; Ulrich Loering; Dirk Hellweg; Peter Meyer; Stefan Xalter; Jens Kugler; Bernhard Gellrich; Stefan Hembacher; Bernhard Geuppert; Aksel Goehnermeier

Archive | 2008

Microlithographic projection exposure apparatus and measuring device for a projection lens

Albrecht Ehrmann; Ulrich Wegmann; Rainer Hoch; Joerg Mallmann; Karl-Heinz Schuster; Ulrich Loering; Toralf Gruner; Bernhard Kneer; Bernhard Geuppert; Franz Sorg; Jens Kugler; Norbert Wabra

Archive | 2010

Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate

Ulrich Loering; Gerd Reisinger; Franz-Josef Stickel; Sonja Schneider; Johann Trenkler; Stefan Kraus; Gordon Doering; Aksel Goehnermeier

Archive | 2007

Projection exposure system e.g. step-and-scan system, for semiconductor lithography, has optical element e.g. lens, manipulated by actuator of manipulator e.g. Alvarez-element, where manipulator is designed in exchangeable manner

Bernhard Gellrich; Bernhard Geuppert; Aksel Göhnermeier; Dirk Hellweg; Stefan Hembacher; Jens Kugler; Guido Limbach; Ulrich Loering; Peter Meyer; Armin Schöppach; Franz Sorg; Ulrich Weber; Stefan Xalter

Archive | 2013

METHOD OF OPERATING A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY

Olaf Conradi; Michael Totzeck; Ulrich Loering; Dirk Juergens; Ralf Mueller; Christian Wald

Archive | 2010

Lithography projection objective, and a method for correcting image defects of the same

Ulrich Loering; Vladan Blahnik; Wilhelm Ulrich; Daniel Kraehmer; Norbert Wabra

Archive | 2012

OPTICAL SYSTEM OF MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND METHOD OF CORRECTING WAVEFRONT DEFORMATION IN SAME

Matthias Exler; Ulrich Loering; Toralf Gruner; Holger Walter

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Collaboration

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Franz Sorg

Carl Zeiss AG

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Bernhard Geuppert

Carl Zeiss AG

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Guido Limbach

Carl Zeiss AG

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Jens Kugler

Carl Zeiss AG

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Stefan Hembacher

Carl Zeiss AG

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Toralf Gruner

Carl Zeiss AG

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Bernhard Gellrich

Carl Zeiss AG

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Dirk Hellweg

Carl Zeiss AG

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Holger Walter

Carl Zeiss AG

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Peter Meyer

Carl Zeiss AG

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