Thomas E. Spikes

Semiconductor fabrication employing a flowable oxide to enhance planarization in a shallow trench isolation process

Flash memory device having high permittivity stacked dielectric and fabrication thereof

Method and structure for isolating semiconductor devices after transistor formation

Method of manufacturing an isolation region in a semiconductor device using a flowable oxide-generating material

High density trench fill due to new spacer fill method including isotropically etching silicon nitride spacers

Method of making salicidation of source and drain regions with metal gate MOSFET

Method of making ultra thin gate oxide using aluminum oxide

Semiconductor fabrication employing a local interconnect

Wafer cleaning procedure useful in the manufacture of a non-volatile memory device

Method and apparatus for upper level substrate isolation integrated with bulk silicon