Sey-Ping Sun

Semiconductor device with self-aligned metal-containing gate

Method of making an ultra thin silicon nitride film

Method of manufacturing an isolation region in a semiconductor device using a flowable oxide-generating material

Ultrathin deposited gate dielectric formation using low-power, low-pressure PECVD for improved semiconductor device performance

Ultra-thin gate oxide formation using an N2O plasma

Method for forming an integrated circuit memory cell and product thereof

In-situ stack for high volume production of isolation regions

In-situ SiON deposition/bake/TEOS deposition process for reduction of defects in interlevel dielectric for integrated circuit interconnects

Method of forming silicon nitride films

Method of manufacturing a semiconductor device using advanced contact formation