Network


Latest external collaboration on country level. Dive into details by clicking on the dots.

Hotspot


Dive into the research topics where David Hemker is active.

Publication


Featured researches published by David Hemker.


international workshop on junction technology | 2012

New generations of tools sets that enable FDSOI and 3-D tri-gate technologies

Reza Arghavani; Shashank C. Deshmukh; David Hemker; Gowri Kamarthy; Jeffrey Marks; Vahid Vahedi

Today no insurmountable obstacles are foreseen inhibiting scaling logic devices to the 10nm node. Cost effective processes and equipment sets have been developed that allow both 3-D Tri-Gate and Ultra-Thin Body SOI integration schemes to be scaled. This allows the equipment industry to focus on innovations of new material and their integration into cost effective tool sets in time for high volume manufacturing in sub 10nm node technology. In this paper we review various process challenges the equipment industry overcame to enable the 3-D Tri-Gate and Ultra-Thin Body SOI architecture in partnership with integrated device manufactures.


Archive | 2004

Apparatus and method for providing a confined liquid for immersion lithography

David Hemker; Fred C. Redeker; John M. Boyd; John M. de Larios; Michael Ravkin; Mikhail Korolik


Archive | 1996

Plasma processing systems

Andrew D. Bailey; Alan M. Schoepp; David Hemker; Mark Wilcoxson; Andras Kuthi


Archive | 2002

Methods for reducing contamination of semiconductor substrates

Robert P. Chebi; David Hemker


Archive | 2000

Plasma processing system with dynamic gas distribution control

Andrew D. Bailey; Alan M. Schoepp; David Hemker; Mark Wilcoxson


Archive | 2000

Materials and gas chemistries for processing systems

Andrew D. Bailey; Alan M. Schoepp; David Hemker; Mark Wilcoxson


Archive | 2004

Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same

Tuqiang Ni; Wenli Collison; David Hemker; Lumin Li


Archive | 2003

Apparatus and methods for controlling wafer temperature in chemical mechanical polishing

Nicholas Bright; David Hemker


Archive | 2002

Integration of sensor based metrology into semiconductor processing tools

Aleksander Owczarz; Yehiel Gotkis; David Hemker; Rodney Kistler


Archive | 2000

Method and apparatus for varying a magnetic field to control a volume of a plasma

Andrew D. Bailey; David Hemker

Collaboration


Dive into the David Hemker's collaboration.

Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Researchain Logo
Decentralizing Knowledge