Han-sin Lee

Method for forming a trench isolation structure in an integrated circuit

Trench isolation regions having trench liners with recessed ends

Trench isolation structure, semiconductor device having the same, and trench isolation method

Annealing methods for forming isolation trenches

Trench isolation method for semiconductor device

Method of forming isolation film for semiconductor devices

Method for forming a trench isolation in a semiconductor device

Integrated circuit device isolation methods using high selectivity chemical-mechanical polishing

Graben-Isolierstruktur, eine damit ausgestattete Halbleitervorrichtung und Graben-Isolierverfahren Trench isolation structure, a so-equipped semiconductor device and trench isolation

Trench insulating structure used in the production of a semiconductor device comprises a trench formed in the non-active zones of a semiconductor substrate, an inner wall oxide film