Jin-Hyoung Kwon

The excellent scalability of the RCAT (recess-channel-array-transistor) technology for sub-70nm DRAM feature size and beyond

The technology innovation for extending the RCAT structure to the sub-70nm DRAM is presented. The new technology overcomes the problems induced by shrinkage of the RCAT structure and meets the requirements for the next generation DRAMs, such as high speed and low power performance. The technology roadmap down to the 50nm DRAM feature size of the RCAT development is presented.

A 512 Mb Two-Channel Mobile DRAM (OneDRAM) With Shared Memory Array

A 512 Mb two-channel mobile DRAM (OneDRAM) is developed with 90 nm technology. It can operate on a 1.8 V power supply as two separate mobile DDR or SDR DRAMs through each channel with maximum data rate of 333 Mbps/pin because of its exclusive accessibility from each channel to memory arrays. Data exchange between two channels is also possible by sharing one common memory array, and a new control scheme of DRAM for this sharing is proposed. The new control scheme is based on direct addressing mode to achieve compatibility with normal DRAM interface together with fast data transfer speed between two channels.

Novel robust cell capacitor (Leaning Exterminated Ring type Insulator) and new storage node contact (Top Spacer Contract) for 70nm DRAM technology and beyond

For the first time, novel robust capacitor (Leaning exterminated Ring type Insulator - LERI) and new storage node (SN) contact process (Top Spacer Contact - TSC) are successfully developed with 82nm feature size. These novel processes drastically improved electrical characteristics such as cell capacitance, parasitic bit line capacitance and cell contact resistance, compared to a conventional process. The most pronounced effect using the LERI in COB structure is to greatly improve cell capacitance without twin bit failure. In addition, the TSC technology has an ability to remove a critical ArF lithography. By using the LERI and TSC processes in 82nm 512M DDR DRAM, the cell capacitance of 32fF/cell is achieved with Toxeq of 2.3nm and the parasitic bit line capacitance is reduced by 20%, resulted in great improvement of tRCD (1.5ns).