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Dive into the research topics where Kenro Nakamura is active.

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Featured researches published by Kenro Nakamura.


Optics Express | 2010

On-chip optical interconnection by using integrated III-V laser diode and photodetector with silicon waveguide

Kazuya Ohira; Kentaro Kobayashi; Norio Iizuka; Haruhiko Yoshida; Mizunori Ezaki; Hiroshi Uemura; Akihiro Kojima; Kenro Nakamura; Hideto Furuyama; Hideki Shibata

On-chip integration of III-V laser diodes and photodetectors with silicon nanowire waveguides is demonstrated. Through flip-chip bonding of GaInNAs/GaAs laser diodes directly onto the silicon substrate, efficient heat dissipation was realized and characteristic temperatures as high as 132K were achieved. Spot-size converters for the laser-to-waveguide coupling were used, with efficiencies greater than 60%. The photodetectors were fabricated by bonding of InGaAs/InP wafers directly to silicon waveguides and formation of metal-semiconductor-metal structures, giving responsivities as high as 0.74 A/W. Both laser diode and the photodetector were integrated with a single silicon waveguide to demonstrate a complete on-chip optical transmission link.


Archive | 2001

Polishing pad, polishing apparatus and polishing method

Kenro Nakamura


Archive | 2005

Method for manufacturing semiconductor device and polishing apparatus

Kenro Nakamura; Naoto Miyashita; Takashi Yoda; Katsuya Okumura


Archive | 2005

Polishing device and method therefor

Kenro Nakamura; Takeshi Nishioka; Hiroyuki Yano; 賢朗 中村; 博之 矢野; 岳 西岡


Archive | 1998

Polishing method and slurry

Takeo Kubota; Fukugaku Minami; Kenro Nakamura; 賢朗 中村; 学 南幅; 壮男 窪田


Archive | 2000

Polishing pad, polishing device, and polishing method

Kenro Nakamura; 賢朗 中村


Archive | 2013

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND MANUFACTURING APPARATUS

Kenro Nakamura; Mitsuyoshi Endo; Kazuyuki Higashi; Takashi Shirono


Archive | 1999

Polishing method and polishing liquid

Kenro Nakamura; Takeo Kubota; Gaku Minamihaba


MRS Proceedings | 1999

Chemical Vapor Deposition and Electrode Technologies for (Ba,Sr)TiO 3 Capacitor Used in Gigabit Dram

Kazuhiro Eguchi; Katsuhiko Hieda; J. Nakahira; Masahiro Kiyotoshi; M. Nakabayashi; Soichi Yamazaki; M. Izuha; Tomonori Aoyama; Jun Lin; Kenro Nakamura; S. Niwa; H. Tomita; A. Shimada; Yusuke Kohyama; Yutaka Ishibashi; Y. Fukuzumi; Tsunetoshi Arikado; Katsuya Okumura


international interconnect technology conference | 2018

Novel Bonding Process Using Ultra-thin Mn for Highly Robust and Reliable Cu/SiO Hybrid Bonding

Kengo Uchida; Kazumichi Tsumura; Kenro Nakamura; Kazuyuki Higashi; Yoshiaki Sugizaki; Hideki Shibata

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Katsuhiko Hieda

Kyushu Institute of Technology

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