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Dive into the research topics where Kirk D. Peterson is active.

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Featured researches published by Kirk D. Peterson.


advanced semiconductor manufacturing conference | 2010

Device-design metrics to improve manufacturability

Kirk D. Peterson; Ron Logan; Xiaojun Yu; Kevin K. Dezfulian; Greg Bazan; Jon Winslow; Noah Zamdmer; Lenny Dubuque; Brian Walsh; Andrew H. Norfleet; Fran Clougherty; Ben Bayat; Anda C. Mocuta; Ken Rim

Over the past three technology generations we have made systematic observations on device-design strategies leading to optimal circuit-limited yield. These strategies now impose additional considerations that need to be directly coupled into the technology-development paradigm. At the core of the present discussion is the balance between traditional FET (Field Effect Transistor) and small-circuit optimization and the concurrent impact seen at product level. Certain device-design tradeoffs need to be understood in order to maximize performance for a diverse range of products.


Archive | 2002

Double planar gated SOI MOSFET structure

James W. Adkisson; John A. Bracchitta; John J. Ellis-Monaghan; Jerome B. Lasky; Effendi Leobandung; Kirk D. Peterson; Jed H. Rankin


Archive | 2004

BICMOS TECHNOLOGY ON SOI SUBSTRATES

John J. Ellis-Monaghan; Alvin J. Joseph; Qizhi Liu; Kirk D. Peterson


Archive | 2001

Borderless contact to diffusion with respect to gate conductor and methods for fabricating

James Allan Bruce; Jonathan D. Chapple-Sokol; Charles W. Koburger; Michael J. Lercel; Randy W. Mann; James S. Nakos; John J. Pekarik; Kirk D. Peterson; Jed H. Rankin


Archive | 2005

Dual silicide process to improve device performance

John J. Ellis-Monaghan; Dale W. Martin; William J. Murphy; James S. Nakos; Kirk D. Peterson


Archive | 2007

METHOD AND STRUCTURE TO PREVENT CIRCUIT NETWORK CHARGING DURING FABRICATION OF INTEGRATED CIRCUITS

Jeffrey P. Gambino; Kirk D. Peterson


Archive | 1999

Method and structure for controlling the interface roughness of cobalt disilicide

Paul D. Agnello; Cyril Cabral; Roy A. Carruthers; J. M. E. Harper; Christian Lavoie; Kirk D. Peterson; Robert J. Purtell; R. A. Roy; Jean Jordan-Sweet; Yun Yu Wang


Archive | 2007

High dynamic range imaging cell with electronic shutter extensions

John J. Ellis-Monaghan; Alain Loiseau; Kirk D. Peterson


Archive | 1998

Combined chemical mechanical polishing and reactive ion etching process

Thomas G. Ference; William F. Landers; Michael J. Macdonald; Walter E. Mlynko; Mark P. Murray; Kirk D. Peterson


Archive | 2010

Nitride etch for improved spacer uniformity

James A. Culp; John J. Ellis-Monaghan; Jeffrey P. Gambino; Kirk D. Peterson; Jed H. Rankin; Christa R. Willets

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