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Dive into the research topics where Larios John M. De is active.

Publication


Featured researches published by Larios John M. De.


Archive | 2004

Method and apparatus for removing a residual organic layer from a substrate using reactive gases

Larios John M. De


Archive | 2008

Method and apparatus for contained chemical surface treatment

Katrina Mikhaylichenko; Fritz C. Redeker; Erik M. Freer; Mikhail Korolik; Larios John M. De; Mike Ravkin


Archive | 2007

Measuring fluid quantities, blending liquid constituents, and dispensing blends

Aleksander Owczarz; Robert Knop; Mike Ravkin; Larios John M. De


Archive | 2005

System and method of cleaning and etching a substrate

Mikhail Korolik; John M. Boyd; Katrina A. Mikhaylich; Michael Ravkin; Fred C. Redeker; Larios John M. De


Archive | 2005

Proximity head substrate meniscus flow modulation

James P. Garcia; Fred C. Redeker; Larios John M. De


Archive | 2004

System and method for integrating in-situ metrology within a wafer treatment process

John M. Boyd; Larios John M. De; Michael Ravkin; Fred C. Redeker


Archive | 2010

VERFAHREN ZUR BEREITSTELLUNG EINER EINGEGRENZTEN FLÜSSIGKEIT FÜR DIE IMMERSIONSLITHOGRAPHIE

David Hemker; Fred C. Redeker; John M. Boyd; Larios John M. De; Michael Ravkin; Mikhail Korolik


Archive | 2010

Apparatus for depositing and planarizing thin film of semiconductor wafer

John M. Boyd; Larios John M. De; Yezdi Dordi; Mike Ravkin; Fred C. Redeker; デラリオス・ジョン・エム.; ドーディ・イエッジ・エヌ.; ボイド・ジョン; ラヴキン・マイク; レデカー・フレッド・シー.


Archive | 2008

Procédé et appareil pour un traitement chimique de surface confiné

Katrina Mikhaylichenko; Fritz C. Redeker; Erik M. Freer; Mikhail Korolik; Larios John M. De; Mike Ravkin


Archive | 2008

Nahfeldkopf mit gewinkeltem vakuumleitungssystem sowie entsprechende vorrichtung und entsprechendes verfahren

Michael Ravkin; Larios John M. De; Fred C. Redeker; Mikhail Korolik; Erik M. Freer

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