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Mark H. Somervell

Tokyo Electron

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Publication

Featured researches published by Mark H. Somervell.

Archive | 2012

METHOD OF FORMING PATTERNS USING BLOCK COPOLYMERS AND ARTICLES THEREOF

Benjamen M. Rathsack; Mark H. Somervell; Meenakshisundaram Gandhi

Archive | 2009

Dual tone development processes

Carlos A. Fonseca; Mark H. Somervell; Steven Scheer

Archive | 2014

USE OF GRAPHO-EPITAXIAL DIRECTED SELF-ASSEMBLY TO PRECISELY CUT LINES

Mark H. Somervell; Benjamen M. Rathsack

Archive | 2013

Chemi-epitaxy in directed self-assembly applications using photo-decomposable agents

Mark H. Somervell; Michael A. Carcasi

Archive | 2008

METHOD FOR CREATING GRAY-SCALE FEATURES FOR DUAL TONE DEVELOPMENT PROCESSES

Carlos A. Fonseca; Mark H. Somervell; Steven Scheer

Archive | 2011

Method of slimming radiation-sensitive material lines in lithographic applications

Michael A. Carcasi; Benjamin M. Rathsack; Mark H. Somervell

Archive | 2009

Dual tone development with plural photo-acid generators in lithographic applications

Carlos A. Fonseca; Mark H. Somervell; Steven Scheer; Wallace P. Printz

Archive | 2009

Variable Resist Protecting Groups

Carlos A. Fonseca; Mark H. Somervell; Steven Scheer

Archive | 2014

Use of topography to direct assembly of block copolymers in grapho-epitaxial applications

Mark H. Somervell; Makoto Muramatsu; Benjamen M. Rathsack; Tadatoshi Tomita; Hisashi Genjima; Hidetami Yaegashi; Kenichi Oyama

Archive | 2009

Flood exposure process for dual tone development in lithographic applications

Carlos A. Fonseca; Mark H. Somervell; Steven Scheer

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Steven Scheer

Tokyo Electron

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Benjamen M. Rathsack

Tokyo Electron

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Michael A. Carcasi

Tokyo Electron

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Carlos A. Fonseca

Tokyo Electron

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Joshua S. Hooge

Tokyo Electron

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Ian J. Brown

Tokyo Electron

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Wallace P. Printz

Tokyo Electron

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Benjamin M. Rathsack

Tokyo Electron

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Roel Gronheid

Tokyo Electron

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Sophie Bernard

Tokyo Electron

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