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Rumen Iliew

Carl Zeiss AG

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Publication

Featured researches published by Rumen Iliew.

Archive | 2014

Projection Lens for EUV Microlithography, Film Element and Method for Producing a Projection Lens Comprising a Film Element

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Christian Wald; Rumen Iliew; Thomas Schicketanz; Toralf Gruner; Walter Pauls; Holger Schmidt

Archive | 2014

Spiegelanordnung für eine EUV-Projektionsbelichtungsanlage, Verfahren zum Betreiben derselben, sowie EUV-Projektionsbelichtungsanlage

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Rumen Iliew; Walter Pauls

Archive | 2013

Mirror arrangement for an euv projection exposure apparatus, method for operating the same, and euv projection exposure apparatus

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Rumen Iliew; Walter Pauls

Archive | 2013

Projektionsobjektiv für EUV-Mikrolithographie, Folienelement und Verfahren zur Herstellung eines Projektionsobjektivs mit Folienelement

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Christian Wald; Rumen Iliew; Thomas Schicketanz; Toralf Gruner

Archive | 2014

Verfahren zur Kalibrierung eines Manipulators

Rumen Iliew; Boris Bittner

Archive | 2014

VERFAHREN ZUM BETREIBEN EINER MIKROLITHOGRAPHISCHEN PROJEKTIONSBELICHTUNGSANLAGE

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Rumen Iliew

Archive | 2013

Method for operating a microlithographic projection exposure apparatus

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Rumen Iliew

Archive | 2014

Reflective Optical Element

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Rumen Iliew; Walter Pauls

Archive | 2014

Reflektives optisches Element Reflective optical element

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Rumen Iliew; Walter Pauls

Archive | 2014

Projektionsbelichtungssystem für EUV-Lithographie und Verfahren zum Betreiben des Projektionsbelichtungssystems

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Christian Wald; Rumen Iliew; Walter Pauls; Holger Schmidt

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Collaboration

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Boris Bittner

Carl Zeiss AG

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Hendrik Wagner

Carl Zeiss AG

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Norbert Wabra

Carl Zeiss AG

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Ricarda Schneider

Carl Zeiss AG

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Sonja Schneider

Carl Zeiss AG

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Walter Pauls

Carl Zeiss AG

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Christian Wald

Carl Zeiss AG

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Thomas Schicketanz

Carl Zeiss AG

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Toralf Gruner

Carl Zeiss AG

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Holger Schmidt

Carl Zeiss AG

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