Stephan Kruegel

Field effect transistor with an improved gate contact and method of fabricating the same

Method of forming a metal silicide gate in a standard MOS process sequence

Drain/source extension structure of a field effect transistor including doped high-k sidewall spacers

Technique for forming a substrate having crystalline semiconductor regions of different characteristics

Method of filling an opening in a material layer with an insulating material

INCREASING ETCH SELECTIVITY DURING THE PATTERNING OF A CONTACT STRUCTURE OF A SEMICONDUCTOR DEVICE

Method of forming layers of oxide on a surface of a substrate

Methods of forming drain/source extension structures of a field effect transistor using a doped high-k dielectric layer

Field effect transistor with reduced gate delay and method of fabricating the same

TRENCH ISOLATION STRUCTURE FOR A SEMICONDUCTOR DEVICE WITH REDUCED SIDEWALL STRESS AND A METHOD OF MANUFACTURING THE SAME